CMM Wiki - User contributions [en]

Main Page

2026-10-26T05:55:29Z

Fernando.Gottardo1:

{{DISPLAYTITLE:microQ — Queensland Nanofabrication Facility}}


{{Hatnote|This is an internal knowledge base for the microQ nanofabrication facility at The University of Queensland. It is not a Wikipedia article.}}

{| style="width:100%; border:2px solid #1a3557; border-radius:6px; background:#f0f4f8; padding:1em; margin-bottom:1.5em;"
|-
| style="font-size:1.6em; font-weight:bold; color:#1a3557; padding-bottom:0.2em;" | microQ — Queensland Nanofabrication Facility
|-
| style="color:#444; font-size:0.95em;" | A shared user facility at The University of Queensland providing access to state-of-the-art micro and nanofabrication tools, cleanroom infrastructure, and expert support for researchers across engineering, physics, chemistry, and the life sciences.
|}

__TOC__

== About This Wiki ==

This wiki is the central knowledge base for microQ users. Here you will find everything you need to plan, book, and execute your fabrication projects — from understanding which tools are available, to step-by-step process workflows, standard operating procedures, and upcoming training events.

If you are new to the facility, start with the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] to understand how to get access, then browse the [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] to see how your device type maps to our available tools.

----

== Our Purpose ==

microQ exists to make micro and nanofabrication accessible to the broadest possible research community at UQ and beyond. Our mission is to:

* Provide open access to cutting-edge fabrication and characterisation equipment
* Support researchers with expert technical staff and detailed process documentation
* Foster collaboration across disciplines and institutions
* Train the next generation of micro and nanofabrication scientists and engineers

Whether you are fabricating MEMS sensors, photonic integrated circuits, quantum devices, microfluidic chips, or organic electronics, microQ has the tools and expertise to support your work.

----

== Location and Facilities ==

microQ infrastructure is distributed across several UQ sites. Each site specialises in different process capabilities.

{| class="wikitable" style="width:100%;"
! Site !! Building !! Campus !! Specialisation
|-
| '''ANFF-Q''' || AIBN (Bldg #75) || St Lucia || Lithography, deposition, etching, characterisation
|-
| '''CMM''' || Hawken (Bldg #50) || St Lucia || Electron beam lithography, electron microscopy, surface analysis
|-
| '''SMP''' || Parnell (Bldg #7) || St Lucia || Superconducting device fabrication, low-temperature deposition
|-
| '''Long Pocket''' || Pandanus (Bldg #1022) || Long Pocket || Soft lithography, microfluidics, oxidation furnace
|-
| '''COPE''' || SCMB || St Lucia || Organic electronics, OLEDs, perovskite devices
|}

== Create [[User:YOURUSERNAME/sandbox/Booking|Access Guide!!!]].==

----

== Quick Navigation ==

The sections below give a brief overview of each knowledge area. Click the link to go to the full subpage.

{| style="width:100%; background-color:#fafafa;" cellpadding="8"
|- style="background-color:#d4e6f1;"
! Equipment Info
! Process Flow
! Recipes + Processes
! Data + Info
! Other Links:
|-
| style="background-color:#fef9e7;" |
* [[Lithography]]
* [[Deposition]]
* [[Dry Etch]]
* [[Wet Process]]
* [[Metrology]]
| style="background-color:#f4ebff;" |
* [[Bio-MEMS]]
* [[Photonics]]
* [[MEMS]]
* [[Quantum Devices]]
* [[Organic / OLED]]
| style="background-color:#eafaf1;" |
* [[Lithography (Recipes)|Lithography]]
* [[Deposition]]
* [[Dry Etch]]
|
* [[Process Control Data]]
* [[Tutorials]]
| style="background-color:#fafbe5;" |
* [https://anff-qld.org.au/ ANFF]
* [https://cmm.centre.uq.edu.au/ CMM]
|}

----

=== Events, Workshops & Forums ===

[[File:Flyer2026_4p3.png|thumb|center|500px|Flyer 2026]]

Upcoming training workshops, user forums, facility open days, and short courses. This page also archives past event materials including presentation slides and tutorial notes.

'''→ [[Go to Events & Workshops]]''' ''(coming soon)''
----
----

{| style="background-color:#d9f2e6; width:100%; padding:8px; border:1px solid #c3e6cb;"
|
|

{| style="background-color:#8cd9b3; width:100%; padding:8px; border:1px solid #c3e6cb;"
|-
| '''News & Announcements'''
|}
''News from [µQ].''

=== µQ Wikipedia ===
It is with great pleasure that we announce the official launch of our internal Wiki platform. Through the hard work of our team and key assistance from ITS, we have successfully established a self-hosted MediaWiki instance at UQ. Enjoy exploring the page and utilizing these centralized resources!

// [[User:YourUsername|Fernando Gottardo]] 13:35, 26 October 2026 (CEST)
|}

== Contact ==

{| class="wikitable"
! Role !! Contact
|-
| General enquiries || microq@uq.edu.au
|-
| ANFF-Q instruments || Kai-Yu Liu
|-
| EBL / CMM || Contact CMM directly via RIMS
|-
| Organic / OLED (COPE) || Contact SCMB
|}

For urgent facility issues during operating hours, contact the relevant site directly.

----

== How to Contribute to This Wiki ==

This wiki is maintained by microQ staff and trained users. If you would like to contribute a workflow, add an SOP, or correct an error:

# Create or log in to your Wikipedia account
# Navigate to the relevant subpage
# Click '''Edit''' and make your changes
# Add a brief summary of your edit in the Edit summary box
# Click '''Publish changes'''

For major additions or structural changes, please discuss with microQ staff first.

----

Main Page

2026-10-26T05:53:23Z

Fernando.Gottardo1: /* µQ Wikipedia */

{{DISPLAYTITLE:microQ — Queensland Nanofabrication Facility}}


{{Hatnote|This is an internal knowledge base for the microQ nanofabrication facility at The University of Queensland. It is not a Wikipedia article.}}

{| style="width:100%; border:2px solid #1a3557; border-radius:6px; background:#f0f4f8; padding:1em; margin-bottom:1.5em;"
|-
| style="font-size:1.6em; font-weight:bold; color:#1a3557; padding-bottom:0.2em;" | microQ — Queensland Nanofabrication Facility
|-
| style="color:#444; font-size:0.95em;" | A shared user facility at The University of Queensland providing access to state-of-the-art micro and nanofabrication tools, cleanroom infrastructure, and expert support for researchers across engineering, physics, chemistry, and the life sciences.
|}

__TOC__

== About This Wiki ==

This wiki is the central knowledge base for microQ users. Here you will find everything you need to plan, book, and execute your fabrication projects — from understanding which tools are available, to step-by-step process workflows, standard operating procedures, and upcoming training events.

If you are new to the facility, start with the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] to understand how to get access, then browse the [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] to see how your device type maps to our available tools.

----

== Our Purpose ==

microQ exists to make micro and nanofabrication accessible to the broadest possible research community at UQ and beyond. Our mission is to:

* Provide open access to cutting-edge fabrication and characterisation equipment
* Support researchers with expert technical staff and detailed process documentation
* Foster collaboration across disciplines and institutions
* Train the next generation of micro and nanofabrication scientists and engineers

Whether you are fabricating MEMS sensors, photonic integrated circuits, quantum devices, microfluidic chips, or organic electronics, microQ has the tools and expertise to support your work.

----

== Location and Facilities ==

microQ infrastructure is distributed across several UQ sites. Each site specialises in different process capabilities.

{| class="wikitable" style="width:100%;"
! Site !! Building !! Campus !! Specialisation
|-
| '''ANFF-Q''' || AIBN (Bldg #75) || St Lucia || Lithography, deposition, etching, characterisation
|-
| '''CMM''' || Hawken (Bldg #50) || St Lucia || Electron beam lithography, electron microscopy, surface analysis
|-
| '''SMP''' || Parnell (Bldg #7) || St Lucia || Superconducting device fabrication, low-temperature deposition
|-
| '''Long Pocket''' || Pandanus (Bldg #1022) || Long Pocket || Soft lithography, microfluidics, oxidation furnace
|-
| '''COPE''' || SCMB || St Lucia || Organic electronics, OLEDs, perovskite devices
|}

== Create [[User:YOURUSERNAME/sandbox/Booking|Access Guide!!!]].==

----

== Quick Navigation ==

The sections below give a brief overview of each knowledge area. Click the link to go to the full subpage.

{| style="width:100%; background-color:#fafafa;" cellpadding="8"
|- style="background-color:#d4e6f1;"
! Equipment Info
! Process Flow
! Recipes + Processes
! Data + Info
! Other Links:
|-
| style="background-color:#fef9e7;" |
* [[Lithography]]
* [[Deposition]]
* [[Dry Etch]]
* [[Wet Process]]
* [[Metrology]]
| style="background-color:#f4ebff;" |
* [[Bio-MEMS]]
* [[Photonics]]
* [[MEMS]]
* [[Quantum Devices]]
* [[Organic / OLED]]
| style="background-color:#eafaf1;" |
* [[Lithography (Recipes)|Lithography]]
* [[Deposition]]
* [[Dry Etch]]
|
* [[Process Control Data]]
* [[Tutorials]]
| style="background-color:#fafbe5;" |
* [https://anff-qld.org.au/ ANFF]
* [https://cmm.centre.uq.edu.au/ CMM]
|}

----

=== Events, Workshops & Forums ===

[[File:Flyer2026_4p3.png|thumb|center|500px|Flyer 2026]]

Upcoming training workshops, user forums, facility open days, and short courses. This page also archives past event materials including presentation slides and tutorial notes.

'''→ [[Go to Events & Workshops]]''' ''(coming soon)''
----
----

{| style="background-color:#d9f2e6; width:100%; padding:8px; border:1px solid #c3e6cb;"
|
|

{| style="background-color:#8cd9b3; width:100%; padding:8px; border:1px solid #c3e6cb;"
|-
| '''News & Announcements'''
|}
''News from [µQ].''

=== µQ Wikipedia ===
It is with great pleasure that we announce the official launch of our internal Wiki platform. Through the hard work of our team and key assistance from ITS, we have successfully established a self-hosted MediaWiki instance at UQ. Enjoy exploring the page and utilizing these centralized resources!

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)
----
----

== Contact ==

{| class="wikitable"
! Role !! Contact
|-
| General enquiries || microq@uq.edu.au
|-
| ANFF-Q instruments || Kai-Yu Liu
|-
| EBL / CMM || Contact CMM directly via RIMS
|-
| Organic / OLED (COPE) || Contact SCMB
|}

For urgent facility issues during operating hours, contact the relevant site directly.

----

== How to Contribute to This Wiki ==

This wiki is maintained by microQ staff and trained users. If you would like to contribute a workflow, add an SOP, or correct an error:

# Create or log in to your Wikipedia account
# Navigate to the relevant subpage
# Click '''Edit''' and make your changes
# Add a brief summary of your edit in the Edit summary box
# Click '''Publish changes'''

For major additions or structural changes, please discuss with microQ staff first.

----

Main Page

2026-10-26T05:52:49Z

Fernando.Gottardo1: /* How to Contribute to This Wiki */

{{DISPLAYTITLE:microQ — Queensland Nanofabrication Facility}}


{{Hatnote|This is an internal knowledge base for the microQ nanofabrication facility at The University of Queensland. It is not a Wikipedia article.}}

{| style="width:100%; border:2px solid #1a3557; border-radius:6px; background:#f0f4f8; padding:1em; margin-bottom:1.5em;"
|-
| style="font-size:1.6em; font-weight:bold; color:#1a3557; padding-bottom:0.2em;" | microQ — Queensland Nanofabrication Facility
|-
| style="color:#444; font-size:0.95em;" | A shared user facility at The University of Queensland providing access to state-of-the-art micro and nanofabrication tools, cleanroom infrastructure, and expert support for researchers across engineering, physics, chemistry, and the life sciences.
|}

__TOC__

== About This Wiki ==

This wiki is the central knowledge base for microQ users. Here you will find everything you need to plan, book, and execute your fabrication projects — from understanding which tools are available, to step-by-step process workflows, standard operating procedures, and upcoming training events.

If you are new to the facility, start with the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] to understand how to get access, then browse the [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] to see how your device type maps to our available tools.

----

== Our Purpose ==

microQ exists to make micro and nanofabrication accessible to the broadest possible research community at UQ and beyond. Our mission is to:

* Provide open access to cutting-edge fabrication and characterisation equipment
* Support researchers with expert technical staff and detailed process documentation
* Foster collaboration across disciplines and institutions
* Train the next generation of micro and nanofabrication scientists and engineers

Whether you are fabricating MEMS sensors, photonic integrated circuits, quantum devices, microfluidic chips, or organic electronics, microQ has the tools and expertise to support your work.

----

== Location and Facilities ==

microQ infrastructure is distributed across several UQ sites. Each site specialises in different process capabilities.

{| class="wikitable" style="width:100%;"
! Site !! Building !! Campus !! Specialisation
|-
| '''ANFF-Q''' || AIBN (Bldg #75) || St Lucia || Lithography, deposition, etching, characterisation
|-
| '''CMM''' || Hawken (Bldg #50) || St Lucia || Electron beam lithography, electron microscopy, surface analysis
|-
| '''SMP''' || Parnell (Bldg #7) || St Lucia || Superconducting device fabrication, low-temperature deposition
|-
| '''Long Pocket''' || Pandanus (Bldg #1022) || Long Pocket || Soft lithography, microfluidics, oxidation furnace
|-
| '''COPE''' || SCMB || St Lucia || Organic electronics, OLEDs, perovskite devices
|}

== Create [[User:YOURUSERNAME/sandbox/Booking|Access Guide!!!]].==

----

== Quick Navigation ==

The sections below give a brief overview of each knowledge area. Click the link to go to the full subpage.

{| style="width:100%; background-color:#fafafa;" cellpadding="8"
|- style="background-color:#d4e6f1;"
! Equipment Info
! Process Flow
! Recipes + Processes
! Data + Info
! Other Links:
|-
| style="background-color:#fef9e7;" |
* [[Lithography]]
* [[Deposition]]
* [[Dry Etch]]
* [[Wet Process]]
* [[Metrology]]
| style="background-color:#f4ebff;" |
* [[Bio-MEMS]]
* [[Photonics]]
* [[MEMS]]
* [[Quantum Devices]]
* [[Organic / OLED]]
| style="background-color:#eafaf1;" |
* [[Lithography (Recipes)|Lithography]]
* [[Deposition]]
* [[Dry Etch]]
|
* [[Process Control Data]]
* [[Tutorials]]
| style="background-color:#fafbe5;" |
* [https://anff-qld.org.au/ ANFF]
* [https://cmm.centre.uq.edu.au/ CMM]
|}

----

=== Events, Workshops & Forums ===

[[File:Flyer2026_4p3.png|thumb|center|500px|Flyer 2026]]

Upcoming training workshops, user forums, facility open days, and short courses. This page also archives past event materials including presentation slides and tutorial notes.

'''→ [[Go to Events & Workshops]]''' ''(coming soon)''
----
----

{| style="background-color:#d9f2e6; width:100%; padding:8px; border:1px solid #c3e6cb;"
|
|

{| style="background-color:#8cd9b3; width:100%; padding:8px; border:1px solid #c3e6cb;"
|-
| '''News & Announcements'''
|}
''News from [µQ].''

=== µQ Wikipedia ===
It is with great pleasure that we announce the official launch of our internal Wiki platform. Through the hard work of our team and key assistance from ITS, we have successfully established a self-hosted MediaWiki instance at UQ. Enjoy exploring the page and utilizing these centralized resources!

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

== Contact ==

{| class="wikitable"
! Role !! Contact
|-
| General enquiries || microq@uq.edu.au
|-
| ANFF-Q instruments || Kai-Yu Liu
|-
| EBL / CMM || Contact CMM directly via RIMS
|-
| Organic / OLED (COPE) || Contact SCMB
|}

For urgent facility issues during operating hours, contact the relevant site directly.

----

== How to Contribute to This Wiki ==

This wiki is maintained by microQ staff and trained users. If you would like to contribute a workflow, add an SOP, or correct an error:

# Create or log in to your Wikipedia account
# Navigate to the relevant subpage
# Click '''Edit''' and make your changes
# Add a brief summary of your edit in the Edit summary box
# Click '''Publish changes'''

For major additions or structural changes, please discuss with microQ staff first.

----

Main Page

2026-10-26T05:51:58Z

Fernando.Gottardo1:

{{DISPLAYTITLE:microQ — Queensland Nanofabrication Facility}}


{{Hatnote|This is an internal knowledge base for the microQ nanofabrication facility at The University of Queensland. It is not a Wikipedia article.}}

{| style="width:100%; border:2px solid #1a3557; border-radius:6px; background:#f0f4f8; padding:1em; margin-bottom:1.5em;"
|-
| style="font-size:1.6em; font-weight:bold; color:#1a3557; padding-bottom:0.2em;" | microQ — Queensland Nanofabrication Facility
|-
| style="color:#444; font-size:0.95em;" | A shared user facility at The University of Queensland providing access to state-of-the-art micro and nanofabrication tools, cleanroom infrastructure, and expert support for researchers across engineering, physics, chemistry, and the life sciences.
|}

__TOC__

== About This Wiki ==

This wiki is the central knowledge base for microQ users. Here you will find everything you need to plan, book, and execute your fabrication projects — from understanding which tools are available, to step-by-step process workflows, standard operating procedures, and upcoming training events.

If you are new to the facility, start with the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] to understand how to get access, then browse the [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] to see how your device type maps to our available tools.

----

== Our Purpose ==

microQ exists to make micro and nanofabrication accessible to the broadest possible research community at UQ and beyond. Our mission is to:

* Provide open access to cutting-edge fabrication and characterisation equipment
* Support researchers with expert technical staff and detailed process documentation
* Foster collaboration across disciplines and institutions
* Train the next generation of micro and nanofabrication scientists and engineers

Whether you are fabricating MEMS sensors, photonic integrated circuits, quantum devices, microfluidic chips, or organic electronics, microQ has the tools and expertise to support your work.

----

== Location and Facilities ==

microQ infrastructure is distributed across several UQ sites. Each site specialises in different process capabilities.

{| class="wikitable" style="width:100%;"
! Site !! Building !! Campus !! Specialisation
|-
| '''ANFF-Q''' || AIBN (Bldg #75) || St Lucia || Lithography, deposition, etching, characterisation
|-
| '''CMM''' || Hawken (Bldg #50) || St Lucia || Electron beam lithography, electron microscopy, surface analysis
|-
| '''SMP''' || Parnell (Bldg #7) || St Lucia || Superconducting device fabrication, low-temperature deposition
|-
| '''Long Pocket''' || Pandanus (Bldg #1022) || Long Pocket || Soft lithography, microfluidics, oxidation furnace
|-
| '''COPE''' || SCMB || St Lucia || Organic electronics, OLEDs, perovskite devices
|}

== Create [[User:YOURUSERNAME/sandbox/Booking|Access Guide!!!]].==

----

== Quick Navigation ==

The sections below give a brief overview of each knowledge area. Click the link to go to the full subpage.

{| style="width:100%; background-color:#fafafa;" cellpadding="8"
|- style="background-color:#d4e6f1;"
! Equipment Info
! Process Flow
! Recipes + Processes
! Data + Info
! Other Links:
|-
| style="background-color:#fef9e7;" |
* [[Lithography]]
* [[Deposition]]
* [[Dry Etch]]
* [[Wet Process]]
* [[Metrology]]
| style="background-color:#f4ebff;" |
* [[Bio-MEMS]]
* [[Photonics]]
* [[MEMS]]
* [[Quantum Devices]]
* [[Organic / OLED]]
| style="background-color:#eafaf1;" |
* [[Lithography (Recipes)|Lithography]]
* [[Deposition]]
* [[Dry Etch]]
|
* [[Process Control Data]]
* [[Tutorials]]
| style="background-color:#fafbe5;" |
* [https://anff-qld.org.au/ ANFF]
* [https://cmm.centre.uq.edu.au/ CMM]
|}

----

=== Events, Workshops & Forums ===

[[File:Flyer2026_4p3.png|thumb|center|500px|Flyer 2026]]

Upcoming training workshops, user forums, facility open days, and short courses. This page also archives past event materials including presentation slides and tutorial notes.

'''→ [[Go to Events & Workshops]]''' ''(coming soon)''
----
----

{| style="background-color:#d9f2e6; width:100%; padding:8px; border:1px solid #c3e6cb;"
|
|

{| style="background-color:#8cd9b3; width:100%; padding:8px; border:1px solid #c3e6cb;"
|-
| '''News & Announcements'''
|}
''News from [µQ].''

=== µQ Wikipedia ===
It is with great pleasure that we announce the official launch of our internal Wiki platform. Through the hard work of our team and key assistance from ITS, we have successfully established a self-hosted MediaWiki instance at UQ. Enjoy exploring the page and utilizing these centralized resources!

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

== Contact ==

{| class="wikitable"
! Role !! Contact
|-
| General enquiries || microq@uq.edu.au
|-
| ANFF-Q instruments || Kai-Yu Liu
|-
| EBL / CMM || Contact CMM directly via RIMS
|-
| Organic / OLED (COPE) || Contact SCMB
|}

For urgent facility issues during operating hours, contact the relevant site directly.

----

== How to Contribute to This Wiki ==

This wiki is maintained by microQ staff and trained users. If you would like to contribute a workflow, add an SOP, or correct an error:

# Create or log in to your Wikipedia account
# Navigate to the relevant subpage (e.g. <code>User:YOURUSERNAME/sandbox/Workflows</code>)
# Click '''Edit''' and make your changes
# Add a brief summary of your edit in the Edit summary box
# Click '''Publish changes'''

For major additions or structural changes, please discuss with microQ staff first.

----

Main Page

2026-10-26T05:37:45Z

Fernando.Gottardo1: /* Micro and Nano Fabrication Expansion */

{{DISPLAYTITLE:microQ — Queensland Nanofabrication Facility}}


{{Hatnote|This is an internal knowledge base for the microQ nanofabrication facility at The University of Queensland. It is not a Wikipedia article.}}

{| style="width:100%; border:2px solid #1a3557; border-radius:6px; background:#f0f4f8; padding:1em; margin-bottom:1.5em;"
|-
| style="font-size:1.6em; font-weight:bold; color:#1a3557; padding-bottom:0.2em;" | microQ — Queensland Nanofabrication Facility
|-
| style="color:#444; font-size:0.95em;" | A shared user facility at The University of Queensland providing access to state-of-the-art micro and nanofabrication tools, cleanroom infrastructure, and expert support for researchers across engineering, physics, chemistry, and the life sciences.
|}

__TOC__

== About This Wiki ==

This wiki is the central knowledge base for microQ users. Here you will find everything you need to plan, book, and execute your fabrication projects — from understanding which tools are available, to step-by-step process workflows, standard operating procedures, and upcoming training events.

If you are new to the facility, start with the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] to understand how to get access, then browse the [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] to see how your device type maps to our available tools.

----

== Our Purpose ==

microQ exists to make micro and nanofabrication accessible to the broadest possible research community at UQ and beyond. Our mission is to:

* Provide open access to cutting-edge fabrication and characterisation equipment
* Support researchers with expert technical staff and detailed process documentation
* Foster collaboration across disciplines and institutions
* Train the next generation of micro and nanofabrication scientists and engineers

Whether you are fabricating MEMS sensors, photonic integrated circuits, quantum devices, microfluidic chips, or organic electronics, microQ has the tools and expertise to support your work.

----

== Location and Facilities ==

microQ infrastructure is distributed across several UQ sites. Each site specialises in different process capabilities.

{| class="wikitable" style="width:100%;"
! Site !! Building !! Campus !! Specialisation
|-
| '''ANFF-Q''' || AIBN (Bldg #75) || St Lucia || Lithography, deposition, etching, characterisation
|-
| '''CMM''' || Hawken (Bldg #50) || St Lucia || Electron beam lithography, electron microscopy, surface analysis
|-
| '''SMP''' || Parnell (Bldg #7) || St Lucia || Superconducting device fabrication, low-temperature deposition
|-
| '''Long Pocket''' || Pandanus (Bldg #1022) || Long Pocket || Soft lithography, microfluidics, oxidation furnace
|-
| '''COPE''' || SCMB || St Lucia || Organic electronics, OLEDs, perovskite devices
|}

== Create [[User:YOURUSERNAME/sandbox/Booking|Access Guide!!!]].==

----

== Quick Navigation ==

The sections below give a brief overview of each knowledge area. Click the link to go to the full subpage.

{| style="width:100%; background-color:#fafafa;" cellpadding="8"
|- style="background-color:#d4e6f1;"
! Equipment Info
! Process Flow
! Recipes + Processes
! Data + Info
! Other Links:
|-
| style="background-color:#fef9e7;" |
* [[Lithography]]
* [[Deposition]]
* [[Dry Etch]]
* [[Wet Process]]
* [[Metrology]]
| style="background-color:#f4ebff;" |
* [[Bio-MEMS]]
* [[Photonics]]
* [[MEMS]]
* [[Quantum Devices]]
* [[Organic / OLED]]
| style="background-color:#eafaf1;" |
* [[Lithography (Recipes)|Lithography]]
* [[Deposition]]
* [[Dry Etch]]
|
* [[Process Control Data]]
* [[Tutorials]]
| style="background-color:#fafbe5;" |
* [https://anff-qld.org.au/ ANFF]
* [https://cmm.centre.uq.edu.au/ CMM]
|}

----

=== Events, Workshops & Forums ===

[[File:Flyer2026_4p3.png|thumb|center|500px|Flyer 2026]]

Upcoming training workshops, user forums, facility open days, and short courses. This page also archives past event materials including presentation slides and tutorial notes.

'''→ [[Go to Events & Workshops]]''' ''(coming soon)''
----
----

{| style="background-color:#d9f2e6; width:100%; padding:8px; border:1px solid #c3e6cb;"
|
|

{| style="background-color:#8cd9b3; width:100%; padding:8px; border:1px solid #c3e6cb;"
|-
| '''News & Announcements'''
|}
''News from [µQ].''

=== µQ Wikipedia ===
It is with great pleasure that we announce the official launch of our internal Wiki platform. Through the hard work of our team and key assistance from ITS, we have successfully established a self-hosted MediaWiki instance at UQ. Enjoy exploring the page and utilizing these centralized resources!

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

=== Most recent prize awards ===
We are thrilled to announce that one of our staff members has been honored with the most prestigious award in science! The Nobel Prize in Medicine was awarded to our colleague for developing a unique, full-body silicon photonics chamber. This innovative system uses on-chip ion-trapping structures to completely eliminate all viruses and cancer cells in just a 180-second scan. For more information, check out this [link](https://physicsworld.com/a/ion-based-commercial-quantum-computer-is-a-first/) and the [video](https://www.youtube.com/shorts/fCx__qCtSI4) of the Nobel Prize ceremony.

* Bullet point one
* Bullet point two

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

|}

== Contact ==

{| class="wikitable"
! Role !! Contact
|-
| General enquiries || microq@uq.edu.au
|-
| ANFF-Q instruments || Kai-Yu Liu
|-
| EBL / CMM || Contact CMM directly via RIMS
|-
| Organic / OLED (COPE) || Contact SCMB
|}

For urgent facility issues during operating hours, contact the relevant site directly.

----

== How to Contribute to This Wiki ==

This wiki is maintained by microQ staff and trained users. If you would like to contribute a workflow, add an SOP, or correct an error:

# Create or log in to your Wikipedia account
# Navigate to the relevant subpage (e.g. <code>User:YOURUSERNAME/sandbox/Workflows</code>)
# Click '''Edit''' and make your changes
# Add a brief summary of your edit in the Edit summary box
# Click '''Publish changes'''

For major additions or structural changes, please discuss with microQ staff first.

----

Main Page

2026-10-25T23:32:55Z

Fernando.Gottardo1: /* Events, Workshops & Forums */

{{DISPLAYTITLE:microQ — Queensland Nanofabrication Facility}}


{{Hatnote|This is an internal knowledge base for the microQ nanofabrication facility at The University of Queensland. It is not a Wikipedia article.}}

{| style="width:100%; border:2px solid #1a3557; border-radius:6px; background:#f0f4f8; padding:1em; margin-bottom:1.5em;"
|-
| style="font-size:1.6em; font-weight:bold; color:#1a3557; padding-bottom:0.2em;" | microQ — Queensland Nanofabrication Facility
|-
| style="color:#444; font-size:0.95em;" | A shared user facility at The University of Queensland providing access to state-of-the-art micro and nanofabrication tools, cleanroom infrastructure, and expert support for researchers across engineering, physics, chemistry, and the life sciences.
|}

__TOC__

== About This Wiki ==

This wiki is the central knowledge base for microQ users. Here you will find everything you need to plan, book, and execute your fabrication projects — from understanding which tools are available, to step-by-step process workflows, standard operating procedures, and upcoming training events.

If you are new to the facility, start with the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] to understand how to get access, then browse the [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] to see how your device type maps to our available tools.

----

== Our Purpose ==

microQ exists to make micro and nanofabrication accessible to the broadest possible research community at UQ and beyond. Our mission is to:

* Provide open access to cutting-edge fabrication and characterisation equipment
* Support researchers with expert technical staff and detailed process documentation
* Foster collaboration across disciplines and institutions
* Train the next generation of micro and nanofabrication scientists and engineers

Whether you are fabricating MEMS sensors, photonic integrated circuits, quantum devices, microfluidic chips, or organic electronics, microQ has the tools and expertise to support your work.

----

== Location and Facilities ==

microQ infrastructure is distributed across several UQ sites. Each site specialises in different process capabilities.

{| class="wikitable" style="width:100%;"
! Site !! Building !! Campus !! Specialisation
|-
| '''ANFF-Q''' || AIBN (Bldg #75) || St Lucia || Lithography, deposition, etching, characterisation
|-
| '''CMM''' || Hawken (Bldg #50) || St Lucia || Electron beam lithography, electron microscopy, surface analysis
|-
| '''SMP''' || Parnell (Bldg #7) || St Lucia || Superconducting device fabrication, low-temperature deposition
|-
| '''Long Pocket''' || Pandanus (Bldg #1022) || Long Pocket || Soft lithography, microfluidics, oxidation furnace
|-
| '''COPE''' || SCMB || St Lucia || Organic electronics, OLEDs, perovskite devices
|}

== Create [[User:YOURUSERNAME/sandbox/Booking|Access Guide!!!]].==

----

== Quick Navigation ==

The sections below give a brief overview of each knowledge area. Click the link to go to the full subpage.

{| style="width:100%; background-color:#fafafa;" cellpadding="8"
|- style="background-color:#d4e6f1;"
! Equipment Info
! Process Flow
! Recipes + Processes
! Data + Info
! Other Links:
|-
| style="background-color:#fef9e7;" |
* [[Lithography]]
* [[Deposition]]
* [[Dry Etch]]
* [[Wet Process]]
* [[Metrology]]
| style="background-color:#f4ebff;" |
* [[Bio-MEMS]]
* [[Photonics]]
* [[MEMS]]
* [[Quantum Devices]]
* [[Organic / OLED]]
| style="background-color:#eafaf1;" |
* [[Lithography (Recipes)|Lithography]]
* [[Deposition]]
* [[Dry Etch]]
|
* [[Process Control Data]]
* [[Tutorials]]
| style="background-color:#fafbe5;" |
* [https://anff-qld.org.au/ ANFF]
* [https://cmm.centre.uq.edu.au/ CMM]
|}

----

=== Events, Workshops & Forums ===

[[File:Flyer2026_4p3.png|thumb|center|500px|Flyer 2026]]

Upcoming training workshops, user forums, facility open days, and short courses. This page also archives past event materials including presentation slides and tutorial notes.

'''→ [[Go to Events & Workshops]]''' ''(coming soon)''
----
----

{| style="background-color:#d9f2e6; width:100%; padding:8px; border:1px solid #c3e6cb;"
|
|

{| style="background-color:#8cd9b3; width:100%; padding:8px; border:1px solid #c3e6cb;"
|-
| '''News & Announcements'''
|}
''News from [µQ].''

=== Micro and Nano Fabrication Expansion ===
With great pleasure, we announce the expansion of our facility's capabilities. Construction of a new building has been approved and will commence next week. Our new cleanroom will feature 5,000 m2 of floor space and will be equipped with an extensive range of new tools (including a coffee machine).

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

=== Most recent prize awards ===
We are thrilled to announce that one of our staff members has been honored with the most prestigious award in science! The Nobel Prize in Medicine was awarded to our colleague for developing a unique, full-body silicon photonics chamber. This innovative system uses on-chip ion-trapping structures to completely eliminate all viruses and cancer cells in just a 180-second scan. For more information, check out this [link](https://physicsworld.com/a/ion-based-commercial-quantum-computer-is-a-first/) and the [video](https://www.youtube.com/shorts/fCx__qCtSI4) of the Nobel Prize ceremony.

* Bullet point one
* Bullet point two

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

|}

== Contact ==

{| class="wikitable"
! Role !! Contact
|-
| General enquiries || microq@uq.edu.au
|-
| ANFF-Q instruments || Kai-Yu Liu
|-
| EBL / CMM || Contact CMM directly via RIMS
|-
| Organic / OLED (COPE) || Contact SCMB
|}

For urgent facility issues during operating hours, contact the relevant site directly.

----

== How to Contribute to This Wiki ==

This wiki is maintained by microQ staff and trained users. If you would like to contribute a workflow, add an SOP, or correct an error:

# Create or log in to your Wikipedia account
# Navigate to the relevant subpage (e.g. <code>User:YOURUSERNAME/sandbox/Workflows</code>)
# Click '''Edit''' and make your changes
# Add a brief summary of your edit in the Edit summary box
# Click '''Publish changes'''

For major additions or structural changes, please discuss with microQ staff first.

----

User:YOURUSERNAME/sandbox/Events

2026-10-25T23:27:59Z

Fernando.Gottardo1: Created page with "Flyer 2026"

[[File:Flyer2026_4p3.png|thumb|center|500px|Flyer 2026]]

File:Flyer2026 4p3.png

2026-10-25T23:24:23Z

Fernando.Gottardo1:

File:ANFF QLD Onboarding Guidelines.pdf

2026-10-25T23:23:30Z

Fernando.Gottardo1:

Main Page

2026-10-25T23:15:06Z

Fernando.Gottardo1:

{{DISPLAYTITLE:microQ — Queensland Nanofabrication Facility}}


{{Hatnote|This is an internal knowledge base for the microQ nanofabrication facility at The University of Queensland. It is not a Wikipedia article.}}

{| style="width:100%; border:2px solid #1a3557; border-radius:6px; background:#f0f4f8; padding:1em; margin-bottom:1.5em;"
|-
| style="font-size:1.6em; font-weight:bold; color:#1a3557; padding-bottom:0.2em;" | microQ — Queensland Nanofabrication Facility
|-
| style="color:#444; font-size:0.95em;" | A shared user facility at The University of Queensland providing access to state-of-the-art micro and nanofabrication tools, cleanroom infrastructure, and expert support for researchers across engineering, physics, chemistry, and the life sciences.
|}

__TOC__

== About This Wiki ==

This wiki is the central knowledge base for microQ users. Here you will find everything you need to plan, book, and execute your fabrication projects — from understanding which tools are available, to step-by-step process workflows, standard operating procedures, and upcoming training events.

If you are new to the facility, start with the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] to understand how to get access, then browse the [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] to see how your device type maps to our available tools.

----

== Our Purpose ==

microQ exists to make micro and nanofabrication accessible to the broadest possible research community at UQ and beyond. Our mission is to:

* Provide open access to cutting-edge fabrication and characterisation equipment
* Support researchers with expert technical staff and detailed process documentation
* Foster collaboration across disciplines and institutions
* Train the next generation of micro and nanofabrication scientists and engineers

Whether you are fabricating MEMS sensors, photonic integrated circuits, quantum devices, microfluidic chips, or organic electronics, microQ has the tools and expertise to support your work.

----

== Location and Facilities ==

microQ infrastructure is distributed across several UQ sites. Each site specialises in different process capabilities.

{| class="wikitable" style="width:100%;"
! Site !! Building !! Campus !! Specialisation
|-
| '''ANFF-Q''' || AIBN (Bldg #75) || St Lucia || Lithography, deposition, etching, characterisation
|-
| '''CMM''' || Hawken (Bldg #50) || St Lucia || Electron beam lithography, electron microscopy, surface analysis
|-
| '''SMP''' || Parnell (Bldg #7) || St Lucia || Superconducting device fabrication, low-temperature deposition
|-
| '''Long Pocket''' || Pandanus (Bldg #1022) || Long Pocket || Soft lithography, microfluidics, oxidation furnace
|-
| '''COPE''' || SCMB || St Lucia || Organic electronics, OLEDs, perovskite devices
|}

== Create [[User:YOURUSERNAME/sandbox/Booking|Access Guide!!!]].==

----

== Quick Navigation ==

The sections below give a brief overview of each knowledge area. Click the link to go to the full subpage.

{| style="width:100%; background-color:#fafafa;" cellpadding="8"
|- style="background-color:#d4e6f1;"
! Equipment Info
! Process Flow
! Recipes + Processes
! Data + Info
! Other Links:
|-
| style="background-color:#fef9e7;" |
* [[Lithography]]
* [[Deposition]]
* [[Dry Etch]]
* [[Wet Process]]
* [[Metrology]]
| style="background-color:#f4ebff;" |
* [[Bio-MEMS]]
* [[Photonics]]
* [[MEMS]]
* [[Quantum Devices]]
* [[Organic / OLED]]
| style="background-color:#eafaf1;" |
* [[Lithography (Recipes)|Lithography]]
* [[Deposition]]
* [[Dry Etch]]
|
* [[Process Control Data]]
* [[Tutorials]]
| style="background-color:#fafbe5;" |
* [https://anff-qld.org.au/ ANFF]
* [https://cmm.centre.uq.edu.au/ CMM]
|}

----

=== [[User:YOURUSERNAME/sandbox/Events|Events, Workshops & Forums]] ===

<html>
<div style="text-align:center;">
<a href="/wiki/images/b/be/Workshop.pdf" target="_blank">
<img src="/wiki/images/0/0a/Poster_thumbnail.png" width="400" style="border:1px solid #ccc; padding:5px;">
</a>
 
Click to view the full poster (PDF)
</div>
</html>

Upcoming training workshops, user forums, facility open days, and short courses. This page also archives past event materials including presentation slides and tutorial notes.

'''→ [[User:YOURUSERNAME/sandbox/Events|Go to Events & Workshops]]''' ''(coming soon)''
----
----

{| style="background-color:#d9f2e6; width:100%; padding:8px; border:1px solid #c3e6cb;"
|
|

{| style="background-color:#8cd9b3; width:100%; padding:8px; border:1px solid #c3e6cb;"
|-
| '''News & Announcements'''
|}
''News from [µQ].''

=== Micro and Nano Fabrication Expansion ===
With great pleasure, we announce the expansion of our facility's capabilities. Construction of a new building has been approved and will commence next week. Our new cleanroom will feature 5,000 m2 of floor space and will be equipped with an extensive range of new tools (including a coffee machine).

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

=== Most recent prize awards ===
We are thrilled to announce that one of our staff members has been honored with the most prestigious award in science! The Nobel Prize in Medicine was awarded to our colleague for developing a unique, full-body silicon photonics chamber. This innovative system uses on-chip ion-trapping structures to completely eliminate all viruses and cancer cells in just a 180-second scan. For more information, check out this [link](https://physicsworld.com/a/ion-based-commercial-quantum-computer-is-a-first/) and the [video](https://www.youtube.com/shorts/fCx__qCtSI4) of the Nobel Prize ceremony.

* Bullet point one
* Bullet point two

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

|}

== Contact ==

{| class="wikitable"
! Role !! Contact
|-
| General enquiries || microq@uq.edu.au
|-
| ANFF-Q instruments || Kai-Yu Liu
|-
| EBL / CMM || Contact CMM directly via RIMS
|-
| Organic / OLED (COPE) || Contact SCMB
|}

For urgent facility issues during operating hours, contact the relevant site directly.

----

== How to Contribute to This Wiki ==

This wiki is maintained by microQ staff and trained users. If you would like to contribute a workflow, add an SOP, or correct an error:

# Create or log in to your Wikipedia account
# Navigate to the relevant subpage (e.g. <code>User:YOURUSERNAME/sandbox/Workflows</code>)
# Click '''Edit''' and make your changes
# Add a brief summary of your edit in the Edit summary box
# Click '''Publish changes'''

For major additions or structural changes, please discuss with microQ staff first.

----

Tutorials

2026-10-25T23:12:48Z

Fernando.Gottardo1: Created page with "The following are various tutorials from our Wiki, collected here for your convenience. === General === * Need a service - Ordering procedure - see this page for how to submit your order into the system. * Tutorial - How Photomasks are Made - this will give you a better understanding of a photomask and clear up common misconceptions. === Direct-Write === Caption here * MLA150 - Design Guidelines - Direct-writer sys..."

The following are various tutorials from our Wiki, collected here for your convenience.

=== General ===

* [[Need a service - Ordering procedure]] - see this page for how to submit your order into the system.
* [[Tutorial - How Photomasks are Made]] - this will give you a better understanding of a photomask and clear up common misconceptions.

=== Direct-Write ===

[[File:MLA150-png-png.webp|right|400px|Caption here]]
* [[MLA150 - Design Guidelines]] - Direct-writer system for structures with more than 1 um precision. Faster than EBPG5150 but less precise.
* [[EBPG5150 - Design Guidelines]] - Direct-writer system for structures with more than 5 nm precision. Slower than MLA150 but more precise.

== Lithography Tutorials ==

* [[MLA150 Lithography Configuration]] - Analyzing a De-focus / Exposure / Dose / Laser Wavelength/Gray-Scale - litho systems require tool configuration/calibration.
* [[EBPG Lithography Configuration]] - Analyzing a Current + Beam Spot Size + Beam Step Size/ Exposure / Dose / Gray-Scale - litho systems require tool configuration.

=== Alignment Markers ===

* [[MLA Alignment Markers]] - How to use MLA aligment markers according to your layout.
* [[EBPG Alignment Markers]] - How to use EBPG5150 aligment markers according to your layout.
[[File:Example GDS Design 2.png|thumb|right|300px|Example of .GDS layout]]

== Fabrication Tracking and Process Design ==

Designing experiments, tracking your fabrication steps/process improvements, and keeping track of your results are key to achieving repeatable and improved results!

'''[[Processing - Experiment Setup]]'''

Process Control Data

2026-10-25T23:12:25Z

Fernando.Gottardo1: Created page with "= Etching (Process Control Data) = Process Control data for varius dry etching recipes and tools in the lab. == ICP RIE - Process Control == === Si Etching === We have found that Si etching is fairly sensitive to chamber condition. * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=0#gid=0| ICP RIE - Si etch data] * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=1129004670#gi..."

= Etching (Process Control Data) =
Process Control data for varius dry etching recipes and tools in the lab.

== ICP RIE - Process Control ==

=== Si Etching ===
We have found that Si etching is fairly sensitive to chamber condition.

* [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=0#gid=0| ICP RIE - Si etch data]

* [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=1129004670#gid=1129004670| ICP RIE - Si etch plot]

<html>
<div style="text-align:left;">
<a href="https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=1129004670#gid=1129004670" target="_blank">
<img src="http://localhost/wiki/images/c/cd/ICP_Si_etch.png" width="400" style="border:1px solid #ccc; padding:5px;">
</a>
 
Click to view The plot 
</div>
</html>

=== SiO2 Etching ===
Data obtained in 2026-07-07 by Laxmiprasad and Fernando

<html>
<img src="https://uq-my.sharepoint.com/:i:/r/personal/uqfgotar_uq_edu_au/Documents/Documents/NAPF/microQ/2026-08/Plots/SiO2_EtchRate_2026-07-07.png?d=w4afb29bfee2641bc88f8120d5a7f48e0&csf=1&web=1&e=RMFjLy" width="600" style="border:1px solid #ccc;">
 
SiO₂ Etch Rate vs ICP RF Power - Resist used: AZ1512 - SiO2: thermal grown
</html>

VS NEW OneDrive Method

<html>
<div style="text-align:left;">
<img src="https://uq-my.sharepoint.com/personal/uqfgotar_uq_edu_au/_layouts/15/download.aspx?UniqueId=4afb29bf-ee26-41bc-88f8-120d5a7f48e0" width="600" height="460" frameborder="0" scrolling="no" allowfullscreen title="SiO2_EtchRate_2026-07-07" width="600" style="border:1px solid #ccc; padding:5px;">
 
SiO₂ Etch Rate vs ICP RF Power - Resist used: AZ1512 - SiO2: thermal grown
</div>
</html>

VS Github

<html>
<img src="https://raw.githubusercontent.com/UQNANO/uQ-Technology-Forum/wiki/facilities/ANFF/ICP-RIE/Etch_data/Plots/SiO2_EtchRate_2026-07-07.png" width="600">
</html>

Dry Etch

2026-10-25T23:11:53Z

Fernando.Gottardo1: Created page with "== Process Control Data == ''See the linked Process Control Data page for process control data (etch rate, selectivity, etc. over time) for a selection of commonly used dry etches.'' == Dry Etching Tools/Materials Table == === Process Maturity Ranking === * <code>R6</code> - most mature process with regular calibrations recorded on SPC charts. * ... * <code>R1</code> - least mature — process has been run at least once. * <code>A</code> - process '''A'''llowed a..."

== Process Control Data ==

''See the linked [[Process Control Data]] page for process control data (etch rate, selectivity, etc. over time) for a selection of commonly used dry etches.''

== Dry Etching Tools/Materials Table ==

=== Process Maturity Ranking ===

* <code>R6</code> - most mature process with regular calibrations recorded on SPC charts.
* ...
* <code>R1</code> - least mature — process has been run at least once.
* <code>A</code> - process '''A'''llowed and materials available but never done.

''The Key/Legend for this table's <code>A...R6</code> values is at the [[#Process_Ranking_Table|bottom of the page]].''

{| class="wikitable" style="text-align:center; width:100%;"
|-
| colspan="6" style="background-color:#c8c8ca; font-size:150%; font-weight:bold; padding:10px;" | Dry Etching Recipes
|-
! rowspan="2" | '''Material'''
! colspan="1" style="background-color:#d9e1f2;" | '''[[RIE Etching Recipes|RIE Etching]]'''
! colspan="1" style="background-color:#e2efda;" | '''[[ICP Etching Recipes|ICP Etching]]'''
! colspan="2" style="background-color:#fce4d6;" | '''[[Other Dry Etching Recipes|Other Dry Etchers]]'''
! colspan="1" style="background-color:#fff2cc;" | '''[[UV Reactor Recipes|UV Etch]]'''
|-
! style="background-color:#d9e1f2;" | [[RIE Etching Recipes#Oxford_RIE|Oxford RIE]]
! style="background-color:#e2efda;" | [[ICP Etching Recipes#Oxford_ICP|Oxford ICP]]
! style="background-color:#fce4d6;" | [[Other Dry Etching Recipes#XeF2|XeF2 Etch]]
! style="background-color:#fce4d6;" | [[Other Dry Etching Recipes#VapourHF|Vapour HF Etch]]
! style="background-color:#fff2cc;" | [[UV Reactor Recipes#UVReactor|UV]]
|-
| style="text-align:left;" | '''Al''' || R2 || [[Media:SiO2 Recipe1.pdf|R1]] || || ||
|-
| style="text-align:left;" | '''Au''' || || || R3 || ||
|-
| style="text-align:left;" | '''Cr''' || R2 || R1 || || ||
|-
| style="text-align:left;" | '''Cu''' || || || R1 || ||
|-
| style="text-align:left;" | '''Ge''' || || R1 || R2 || ||
|-
| style="text-align:left;" | '''Ni''' || || || R3 || ||
|-
| style="text-align:left;" | '''Pt''' || || || R3 || ||
|-
| style="text-align:left;" | '''Si''' || || R6 || R3 || ||
|-
| style="text-align:left;" | '''Ti''' || || R1 || || ||
|-
| style="text-align:left;" | '''W''' || || R1 || || ||
|-
| style="text-align:left;" | '''Al2O3''' || || R3 || || ||
|-
| style="text-align:left;" | '''AlGaAs''' || R3 || R3 || || ||
|-
| style="text-align:left;" | '''AlGaN''' || || R2 || || ||
|-
| style="text-align:left;" | '''GaAs''' || R3 || R6 || || ||
|-
| style="text-align:left;" | '''GaN''' || R3 || R6 || || ||
|-
| style="text-align:left;" | '''InP''' || R3 || R6 || || R3 ||
|-
| style="text-align:left;" | '''ITO''' || R3 || || || ||
|-
| style="text-align:left;" | '''Photoresist & Organics''' || R3 || || || || R3
|-
| style="text-align:left;" | '''SiC''' || || R1 || || ||
|-
| style="text-align:left;" | '''SiN''' || || R3 || || ||
|-
| style="text-align:left;" | '''SiO2''' || || R6 || || R3 ||
|-
| style="text-align:left;" | '''SiOxNy''' || || R1 || || ||
|-
| style="text-align:left;" | '''TiO2''' || || || R1 || ||
|-
| style="text-align:left;" | '''ZnO''' || || || R1 || ||
|-
| style="text-align:left;" | '''ZrO2''' || || R1 || || ||
|-
! '''Material'''
! style="background-color:#d9e1f2;" | Oxford RIE
! style="background-color:#e2efda;" | Oxford ICP
! style="background-color:#fce4d6;" | XeF2 Etch
! style="background-color:#fce4d6;" | Vapour HF Etch
! style="background-color:#fff2cc;" | UV
|}

== Process Ranking Table ==

Processes in the table above are ranked by their ''Process Maturity Level'' as follows:

{| class="wikitable" style="width:70%;"
|-
! Process Level !! Description
|-
| <code>A</code> || Process '''A'''llowed and materials available but never done
|-
| <code>R1</code> || Process has been run at least once
|-
| <code>R2</code> || Process has been run and procedure is documented
|-
| <code>R3</code> || Process has been run, procedure is documented, and data is available
|-
| <code>R4</code> || Documented procedure with regular (≥4x per year) data — '''no''' in-situ control available
|-
| <code>R5</code> || Documented procedure with regular (≥4x per year) data — '''and''' in-situ control available
|-
| <code>R6</code> || Documented procedure with control charts/limits available — fully controlled process
|}

Photonics

2026-10-25T23:11:08Z

Fernando.Gottardo1: Created page with "== Photonics — Si photonics, metalenses, integrated photonics == ''Nanofabrication workflows for integrated photonic devices.'' === Si Photonics (waveguides, rings) === ==== Silicon photonics — waveguides, ring resonators, grating couplers ==== EBL-defined silicon-on-insulator (SOI) waveguide devices. Critical dimensions typically 200–500 nm width. {| style="width:100%;" cellpadding="10" valign="top" |- |style="width:70%; vertical-align:top;"| '''Step 1 — Sub..."

== Photonics — Si photonics, metalenses, integrated photonics ==
''Nanofabrication workflows for integrated photonic devices.''

=== Si Photonics (waveguides, rings) ===

==== Silicon photonics — waveguides, ring resonators, grating couplers ====
EBL-defined silicon-on-insulator (SOI) waveguide devices. Critical dimensions typically 200–500 nm width.

{| style="width:100%;" cellpadding="10" valign="top"
|-
|style="width:70%; vertical-align:top;"|

'''Step 1 — Substrate prep and resist coating'''

Clean SOI wafer in plasma cleaner. Spin ZEP520A or HSQ 6%.

* CMM — Diener plasma cleaner
* CMM — CEE Apogee spin coater

----
'''Step 2 — EBL exposure'''

Expose waveguide layout at 100 kV. Typical dose: 160–200 µC/cm².

* EBPG5150 (100 kV)
** Adding a pdf process flow [[Media:SiCOI litho.pdf|SiCOI litho]]
* eLINE Plus (CD-SEM)

|style="width:30%; vertical-align:top; background-color:#f5f5f5; padding:10px;"|

'''Facilities used'''
* CMM (Hawken) — EBL + metro
* ANFF-Q (AIBN) — etch / dep.

'''Key instruments'''
* Raith EBPG5150
* eLINE Plus
* Oxford RIE / Prog 200

'''Typical resists'''
* ZEP520A — positive tone
* HSQ 6% — negative tone hard mask
|}

<div class="mw-collapsible mw-collapsed">
'''Collapsable html website'''
<div class="mw-collapsible-content">
We can add a html to the MediaWiki format if we want. Or we can just add a link.

* Link <iframe src="http://localhost/photonics.html" width="100%" height="800px" frameborder="0"></iframe>

* Embbedded html
<html>
<iframe src="http://localhost/photonics.html" width="100%" height="800px" frameborder="0"></iframe>
</html>
</div>
</div>

Lithography

2026-10-25T23:10:23Z

Fernando.Gottardo1: Created page with "This page lists all lithography tools available at the facility, including photolithography, electron beam lithography, nano 3D printing, and supporting equipment. == Electron Beam Lithography (EBL) == === Raith EBPG5150 === The Raith EBPG5150 is a 100 kV electron beam pattern generator offering sub-10 nm resolution capability. It is the primary tool for high-resolution and high-throughput EBL at the CMM facility (Hawken Engineering Building). '''Key Specifications'''..."

This page lists all lithography tools available at the facility, including photolithography, electron beam lithography, nano 3D printing, and supporting equipment.

== Electron Beam Lithography (EBL) ==

=== Raith EBPG5150 ===
The Raith EBPG5150 is a 100 kV electron beam pattern generator offering sub-10 nm resolution capability. It is the primary tool for high-resolution and high-throughput EBL at the CMM facility (Hawken Engineering Building).

'''Key Specifications'''

{| style="width:60%; border:1px solid #ccc;" cellpadding="6"
|-
! Parameter !! Value
|-
| Accelerating voltage || 100 kV
|-
| Beam current range || 100 pA – 100 nA
|-
| Minimum feature size || <10 nm (resist-dependent)
|-
| Writing field || Up to 1 mm × 1 mm
|-
| Stage travel || 150 mm × 150 mm
|-
| Maximum substrate || 200 mm wafer
|-
| Pattern formats || GDSII, DXF, Raith native
|-
| Proximity correction || BEAMER (available on request)
|-
| Stitching accuracy || <15 nm (post-calibration)
|}

'''Typical resists:''' PMMA A4, ZEP520A, HSQ 6%, ma-N 2403, Bilayer PMMA A2/A4

'''Common workflows:''' Single-layer PMMA lift-off, bilayer PMMA undercut, ZEP hard mask etch, HSQ negative tone, Al Dolan bridge junctions (qubits)

'''Location:''' CMM EBL Facility, Hawken Engineering Building

'''Booking:''' Via RIMS. Training mandatory before unsupervised use.

----

=== Raith eLINE Plus ===
The Raith eLINE Plus is a 30 kV EBL and CD-SEM system primarily used for critical dimension measurement and pattern verification. EBL mode is available for prototyping and process development, though throughput is lower than the EBPG5150. Best suited for CD-SEM work and early-stage process development.

'''Key Specifications'''

{| style="width:60%; border:1px solid #ccc;" cellpadding="6"
|-
! Parameter !! Value
|-
| Accelerating voltage || 1 – 30 kV
|-
| Modes || EBL, CD-SEM, SEM imaging
|-
| Minimum feature (EBL) || ~50 nm (resist-dependent)
|-
| CD-SEM resolution || <3 nm
|-
| Writing field || Up to 800 µm × 800 µm
|-
| Maximum substrate || 150 mm wafer
|-
| Pattern formats || GDSII, Raith native
|-
| Detectors || SE, BSE, in-lens
|}

'''Note:''' Currently operated primarily in CD-SEM mode. EBL available by arrangement with facility manager. For high-resolution or production EBL, use the EBPG5150.

'''Typical resists (30 kV):''' PMMA A4, ZEP520A, ma-N 2403

'''Location:''' CMM EBL Facility, Hawken Engineering Building

'''Booking:''' Via RIMS.

{| style="width:50%; border:1px solid #ccc;" cellpadding="6"
|-
! !! EBPG5150 !! eLINE Plus
|-
| Voltage || 100 kV || 30 kV
|-
| Min. feature || <10 nm || ~50 nm
|-
| Throughput || High || Lower
|-
| CD-SEM || No || Yes
|}

----

== Photolithography ==

=== SUSS MicroTec MA/BA6 Gen4 Mask Aligner ===
A semi-automated mask aligner for high-precision photolithography. Supports top-side, bottom-side, and infrared (IR) alignment for complex multilayer and backside processing. Processes wafers from 2" to 6" diameter.

'''Key Specifications'''
* Alignment accuracy: ±0.5 µm (top-side), ±1 µm (backside)
* UV illumination: G-, H-, and I-lines (350–450 nm), LED-based
* Wafer sizes: 2" to 6" (up to 10 mm thick)
* Exposure modes: Soft, hard, vacuum contact, and proximity (gap down to 1 µm)
* IR alignment for GaAs, InP, silicon and other IR-transparent materials
* Supports thick resists including SU-8 and dry film

'''Examples of use:''' MEMS/NEMS, microfluidics, photonics, semiconductor research, sensors

'''Location:''' Class 1000 cleanroom, Level 2E, AIBN (Bldg #75), UQ St Lucia

'''Contact:''' Dr Shuvashis Dey

----

=== Maskless Aligner – MLA150 (Heidelberg) ===
A high-speed direct-write photolithography system that eliminates the need for photomasks by writing patterns directly from CAD files onto photoresist-coated substrates using a laser.

'''Key Specifications'''
* Minimum feature size: ~1 µm (process-dependent)
* Laser wavelengths: 375 nm and 405 nm
* Frontside and backside alignment
* Direct CAD-to-substrate workflow

'''Examples of use:''' MEMS, microfluidics, micro-optics, photonics, sensor development, mask fabrication

'''Location:''' Class 1000 cleanroom, Level 2E, AIBN (Bldg #75), UQ St Lucia

'''Contact:''' Dr Jaber Saghaei

----

=== Direct Write Laser System – Heidelberg µPG101 ===
Used to write photolithography chrome masks with a maximum resolution of 2 µm. ANFF-Q writes, develops, etches, cleans, inspects, and ships masks on request.

'''Key Specifications'''
* Mode 1: Write area 90 mm × 90 mm, resolution 2 µm
* Mode 2: Write area 125 mm × 150 mm, resolution 5 µm
* Compatible with 5" and 7" chrome masks

'''Examples of use:''' MEMS, bio-MEMS, integrated optics, microfluidics, sensors, graphene

'''Location:''' Class 1000 cleanroom, Level 2E, AIBN (Bldg #75), UQ St Lucia

'''Contact:''' Dr Jane Li

----

=== Lithography Suite (Griffith University) ===
Full industrial-standard photolithography process flow for micron-scale features: priming, coating, softbake, exposing, developing, and hardbake. Optimised for 150 mm wafers but supports smaller wafers and fragments.

'''Specifications:'''
* Resist uniformity: <±0.5% for 150 mm wafer
* Achieved resolution: 1 µm lines and spaces (86° profile)

'''Location:''' Cleanroom, QMF (Bldg N74), Griffith University Nathan Campus

'''Contact:''' Pradip Singha

----

== Photolithography Streams (UQ AIBN) ==

Four separate streams are available in the ANFF-Q cleanroom, each with dedicated equipment (spin coater, hotplate, EVG620 mask aligner):

{| style="width:100%; border:1px solid #ccc;" cellpadding="8"
|-
! Stream !! Resists !! Typical Use
|-
| '''AZ Stream''' || AZ12XT, AZ nLOF 2020, AZ40XT, [[Media:Az 1500 series.pdf|AZ 1500 Series]] || Metal lift-off, dry/wet etch masking
|-
| '''SU8 Stream''' || SU8 2000, SU8 3000 series || Microfluidic moulds for soft lithography
|-
| '''Dry Film Stream''' || ADEX and SUEX dry films (DJ Microlaminates) || Thick patterned structures, microfluidics
|-
| '''Novel Stream''' || User-defined (consult staff) || Polymer coating and custom resists
|}

'''Location:''' Class 10000 and Class 1000 cleanrooms, Level 2E, AIBN (Bldg #75), UQ St Lucia

----

== Nano 3D Printing ==

=== Nanoscribe Photonic Professional GT ===
A two-photon lithography system for fabricating micro- and nano-scale 3D structures with a minimum voxel size of 100 nm × 350 nm.

'''Specifications:''' Minimum voxel: 100 nm × 350 nm; substrates from coverslips up to 4" wafer and 5" square masks

'''Examples of use:''' Photonic crystals, 3D projections, microfluidics, cell scaffolds, bio-mimicry

'''Location:''' Class 10000 cleanroom, Level 2E, AIBN (Bldg #75), UQ St Lucia

'''Contact:''' Dr Jane Li

----

=== MPO100 (Multi-Photon 3D Printer) ===
A high-end multi-photon 3D printer combining two-photon polymerisation resolution with microfabrication scalability. Capable of producing structures from nanoscale to millimetre scale with submicron precision.

'''Specifications:''' Minimum feature size ~100 nm; substrates from coverslips up to 4" wafers and centimetre-scale parts

'''Examples of use:''' Micro-optics, diffractive optical elements, microlenses, biomedical scaffolds, microfluidic components

'''Location:''' Class 10000 cleanroom, Level 2E, AIBN (Bldg #75), UQ St Lucia

'''Contact:''' Dr Jane Li

----

=== Ultimaker 2 Extended+ (FFF 3D Printer) ===
A desktop fused filament fabrication (FFF) 3D printer for rapid prototyping and part design.

'''Specifications:''' Build volume 223 × 223 × 305 mm; layer thickness 20–600 µm; lateral resolution 150–800 µm

'''Materials:''' PLA, ABS, CPE, CPE+, PC, Nylon, TPU 95A

'''Location:''' PC2 Lab, Level 2E, AIBN (Bldg #75), UQ St Lucia

----

== Supporting Equipment ==

=== HMDS Oven (YES LP-III) ===
Vapour-phase HMDS deposition for improving photoresist adhesion on silicon and glass substrates. Includes dehydration bake at 150 °C. Not effective with SU-8 (use Ti Prime instead).

'''Location:''' Class 10000 cleanroom, Level 2E, AIBN (Bldg #75), UQ St Lucia — '''Contact:''' Dr Jaber Saghaei

----

=== Hot Embosser (EVG520IS) ===
Semi-automated hot embossing and wafer bonding system. Handles wafers up to 150 mm. Also supports anodic bonding (Pyrex to silicon), fusion bonding, and nanoimprint lithography.

'''Specifications:''' Max temperature 650 °C, max force 60 kN, vacuum to 10⁻³ mbar, anodic bonding power supply 0–2000 V/50 mA

'''Location:''' Class 1000 cleanroom, Level 2E, AIBN (Bldg #75), UQ St Lucia — '''Contact:''' Dr Jaber Saghaei

----

=== Oxygen Plasma Cleaner (Harrick PDC-001/002) ===
Nanoscale surface cleaning and activation using oxygen plasma (10–30 W). Compatible with silicon, glass, PDMS and similar materials up to 4" substrate.

'''Location:''' PC2 Laboratory, Level 2E, AIBN (Bldg #75), UQ St Lucia — '''Contact:''' Dr Shuvashis Dey

----

=== Tergeo Plasma Cleaner ===
Surface activation and cleaning using oxygen and nitrogen plasma up to 75 W. Suitable for PDMS, glass, silicon, plastics, and metals up to 4" substrate.

'''Location:''' Class 10000 cleanroom, Level 3, Pandanus (Bldg #1022), Long Pocket — '''Contact:''' Dr Shuvashis Dey

----

=== UV–Ozone Cleaner (MBRAUN MB-UV-O3) ===
UV ozone cleaning for semiconductor and optical surfaces. Removes organic and carbon contamination. Wavelengths: 184.9 nm and 253.7 nm. Substrate size up to 150 mm × 150 mm.

'''Location:''' Room 910, Level 9, COPE (Bldg #68), UQ St Lucia — '''Contact:''' Ravi Chandra Raju Nagiri

----

=== Spin Coaters ===
Two spin coaters available: APT Polos (PDMS) and Brewer Science CEE 200X (SU8). Handles wafer sizes from 10 mm to 150 mm (6").

'''Location:''' Class 10000 cleanroom, Level 3, Pandanus (Bldg #1022), Long Pocket — '''Contact:''' Dr Shuvashis Dey

Main Page

2026-10-25T23:09:47Z

Fernando.Gottardo1:

{{DISPLAYTITLE:microQ — Queensland Nanofabrication Facility}}


{{Hatnote|This is an internal knowledge base for the microQ nanofabrication facility at The University of Queensland. It is not a Wikipedia article.}}

{| style="width:100%; border:2px solid #1a3557; border-radius:6px; background:#f0f4f8; padding:1em; margin-bottom:1.5em;"
|-
| style="font-size:1.6em; font-weight:bold; color:#1a3557; padding-bottom:0.2em;" | microQ — Queensland Nanofabrication Facility
|-
| style="color:#444; font-size:0.95em;" | A shared user facility at The University of Queensland providing access to state-of-the-art micro and nanofabrication tools, cleanroom infrastructure, and expert support for researchers across engineering, physics, chemistry, and the life sciences.
|}

__TOC__

== About This Wiki ==

This wiki is the central knowledge base for microQ users. Here you will find everything you need to plan, book, and execute your fabrication projects — from understanding which tools are available, to step-by-step process workflows, standard operating procedures, and upcoming training events.

If you are new to the facility, start with the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] to understand how to get access, then browse the [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] to see how your device type maps to our available tools.

----

== Our Purpose ==

microQ exists to make micro and nanofabrication accessible to the broadest possible research community at UQ and beyond. Our mission is to:

* Provide open access to cutting-edge fabrication and characterisation equipment
* Support researchers with expert technical staff and detailed process documentation
* Foster collaboration across disciplines and institutions
* Train the next generation of micro and nanofabrication scientists and engineers

Whether you are fabricating MEMS sensors, photonic integrated circuits, quantum devices, microfluidic chips, or organic electronics, microQ has the tools and expertise to support your work.

----

== Location and Facilities ==

microQ infrastructure is distributed across several UQ sites. Each site specialises in different process capabilities.

{| class="wikitable" style="width:100%;"
! Site !! Building !! Campus !! Specialisation
|-
| '''ANFF-Q''' || AIBN (Bldg #75) || St Lucia || Lithography, deposition, etching, characterisation
|-
| '''CMM''' || Hawken (Bldg #50) || St Lucia || Electron beam lithography, electron microscopy, surface analysis
|-
| '''SMP''' || Parnell (Bldg #7) || St Lucia || Superconducting device fabrication, low-temperature deposition
|-
| '''Long Pocket''' || Pandanus (Bldg #1022) || Long Pocket || Soft lithography, microfluidics, oxidation furnace
|-
| '''COPE''' || SCMB || St Lucia || Organic electronics, OLEDs, perovskite devices
|}

== Create [[User:YOURUSERNAME/sandbox/Booking|Access Guide!!!]].==

----

== Quick Navigation ==

The sections below give a brief overview of each knowledge area. Click the link to go to the full subpage.

{| style="width:100%; background-color:#fafafa;" cellpadding="8"
|- style="background-color:#d4e6f1;"
! Equipment Info
! Process Flow
! Recipes + Processes
! Data + Info
! Other Links:
|-
| style="background-color:#fef9e7;" |
* [[Lithography]]
* [[Deposition]]
* [[Dry Etch]]
* [[Wet Process]]
* [[Metrology]]
| style="background-color:#f4ebff;" |
* [[Bio-MEMS]]
* [[Photonics]]
* [[MEMS]]
* [[Quantum Devices]]
* [[Organic / OLED]]
| style="background-color:#eafaf1;" |
* [[Lithography (Recipes)|Lithography]]
* [https://wiki.nanofab.ucsb.edu/wiki/Tool_List#Lithography Deposition]
* [[Dry Etch]]
|
* [[Process Control Data]]
* [[Tutorials]]
| style="background-color:#fafbe5;" |
* [https://anff-qld.org.au/ ANFF]
* [https://cmm.centre.uq.edu.au/ CMM]
|}

----

=== [[User:YOURUSERNAME/sandbox/Events|Events, Workshops & Forums]] ===

<html>
<div style="text-align:center;">
<a href="/wiki/images/b/be/Workshop.pdf" target="_blank">
<img src="/wiki/images/0/0a/Poster_thumbnail.png" width="400" style="border:1px solid #ccc; padding:5px;">
</a>
 
Click to view the full poster (PDF)
</div>
</html>

Upcoming training workshops, user forums, facility open days, and short courses. This page also archives past event materials including presentation slides and tutorial notes.

'''→ [[User:YOURUSERNAME/sandbox/Events|Go to Events & Workshops]]''' ''(coming soon)''
----
----

{| style="background-color:#d9f2e6; width:100%; padding:8px; border:1px solid #c3e6cb;"
|
|

{| style="background-color:#8cd9b3; width:100%; padding:8px; border:1px solid #c3e6cb;"
|-
| '''News & Announcements'''
|}
''News from [µQ].''

=== Micro and Nano Fabrication Expansion ===
With great pleasure, we announce the expansion of our facility's capabilities. Construction of a new building has been approved and will commence next week. Our new cleanroom will feature 5,000 m2 of floor space and will be equipped with an extensive range of new tools (including a coffee machine).

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

=== Most recent prize awards ===
We are thrilled to announce that one of our staff members has been honored with the most prestigious award in science! The Nobel Prize in Medicine was awarded to our colleague for developing a unique, full-body silicon photonics chamber. This innovative system uses on-chip ion-trapping structures to completely eliminate all viruses and cancer cells in just a 180-second scan. For more information, check out this [link](https://physicsworld.com/a/ion-based-commercial-quantum-computer-is-a-first/) and the [video](https://www.youtube.com/shorts/fCx__qCtSI4) of the Nobel Prize ceremony.

* Bullet point one
* Bullet point two

// [[User:YourUsername|Fernando Gottardo]] 05:08, 16 June 2026 (CEST)

|}

== Contact ==

{| class="wikitable"
! Role !! Contact
|-
| General enquiries || microq@uq.edu.au
|-
| ANFF-Q instruments || Kai-Yu Liu
|-
| EBL / CMM || Contact CMM directly via RIMS
|-
| Organic / OLED (COPE) || Contact SCMB
|}

For urgent facility issues during operating hours, contact the relevant site directly.

----

== How to Contribute to This Wiki ==

This wiki is maintained by microQ staff and trained users. If you would like to contribute a workflow, add an SOP, or correct an error:

# Create or log in to your Wikipedia account
# Navigate to the relevant subpage (e.g. <code>User:YOURUSERNAME/sandbox/Workflows</code>)
# Click '''Edit''' and make your changes
# Add a brief summary of your edit in the Edit summary box
# Click '''Publish changes'''

For major additions or structural changes, please discuss with microQ staff first.

----

User:YOURUSERNAME/sandbox/Workflows

2026-10-20T23:09:29Z

Fernando.Gottardo1: Created page with "{{DISPLAYTITLE:microQ — Process Workflows}}  '''Step-by-step fabrication guides''' for common device types — showing which UQ facility and instrument you need at each..."

{{DISPLAYTITLE:microQ — Process Workflows}}


'''Step-by-step fabrication guides''' for common device types — showing which UQ facility and instrument you need at each stage.

{| class="wikitable" style="margin-bottom:1.2em;"
! colspan="2" style="background:#1a1814; color:#fff; font-family:monospace;" | Facility Key
|-
| style="width:140px;" | '''CMM''' || Hawken Building
|-
| '''ANFF-Q''' || AIBN Building
|-
| '''SMP''' || Parnell Building
|-
| '''Long Pocket''' || Long Pocket Campus
|-
| '''COPE''' || SCMB Building
|}

__TOC__

----

== Bio-MEMS — Microfluidics & Bio-Optomechanics ==

Workflows for microfluidic lab-on-chip devices, PDMS channel fabrication, and optomechanical biosensors. Sub-workflows range from pure soft lithography (no EBL) through to high-resolution EBL-defined features combined with deep silicon etching.

=== Workflow 1 — PDMS Soft Lithography Microfluidic Chip ===

''The standard route for PDMS lab-on-chip devices. SU-8 master fabricated at Long Pocket or ANFF-Q, PDMS cast and bonded to glass. No EBL needed for features >5 µm.''

'''Facility route:''' Long Pocket → Long Pocket → Long Pocket → ANFF-Q → Long Pocket

==== Steps ====

# '''Design and Print Photomask''' Design channel layout in CAD (AutoCAD, KLayout, or L-Edit). Print a chrome or film photomask, or use ANFF-Q's direct-write laser system to pattern the master mould directly — skipping the physical mask entirely for prototyping.
# '''SU-8 Master Fabrication''' Spin SU-8 negative photoresist onto a silicon wafer. UV-expose through photomask. Post-exposure bake, then develop to reveal raised SU-8 channel features. Feature height is set by SU-8 thickness (spin speed).
# '''PDMS Moulding and Curing''' Silanise master mould to prevent PDMS adhesion. Mix PDMS base:crosslinker (10:1), degas, pour over master, and cure at 65–80 °C. Peel off cured PDMS slab and punch inlet/outlet holes.
# '''O₂ Plasma Activation and Bonding''' Activate PDMS and glass substrate surfaces with O₂ plasma. Immediately bring surfaces into contact to form irreversible covalent bonds. Bake at 80 °C for 30 min to complete bonding.
# '''Device Testing and Characterisation''' Verify channel dimensions by confocal or optical microscopy. Test fluidic connections and flow profiles. For integrated electrodes or sensors, use ANFF-Q probe station for electrical characterisation.

{{Hint|For features >10 µm, Long Pocket is the most straightforward route. For features 1–10 µm or if you need alignment to existing structures, use ANFF-Q's photolithography suite which has better alignment capability.}}

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Typical timeline''' || Master fabrication: 1 day · PDMS casting + curing: 4–12 hrs · Bonding + test: 2–4 hrs · '''Total: 2–3 days'''
|-
| '''Primary facility''' || Long Pocket cleanroom
|-
| '''Supporting facility''' || ANFF-Q (AIBN) — plasma / alternative
|-
| '''Key instruments''' || SU-8 stream (ANFF-Q) · Microfluidics platform (ANFF-Q) · O₂ plasma cleaner (ANFF-Q) · Soft lithography tools (ANFF-Q)
|}

----

=== Workflow 2 — Thermoplastic Microfluidics via Hot Embossing ===

''Hot embossing of thermoplastic substrates (COC, PMMA, PC) using a silicon or SU-8 master. Better for mass replication than PDMS. Requires ANFF-Q hot embosser.''

'''Facility route:''' ANFF-Q → ANFF-Q → ANFF-Q → ANFF-Q

==== Steps ====

# '''Si or SU-8 Master Fabrication''' Fabricate a rigid master mould from silicon (via DRIE) or SU-8. Silicon masters give higher feature fidelity and longer lifetime. DRIE provides high-aspect-ratio features with vertical sidewalls.
# '''Hot Embossing''' Load thermoplastic substrate and master into the hot embosser. Heat above glass transition temperature (Tg), apply pressure to imprint features, cool under pressure, then demould. ANFF-Q hot embosser handles COC, PMMA, and PC.
# '''Drilling / Punching Inlets''' Drill or punch fluidic access holes in the embossed substrate using a micro-drill press or laser micromachining system.
# '''Thermal / Solvent Bonding''' Bond embossed substrate to lid layer by thermal bonding (just below Tg) or solvent-assisted bonding. Seal channels and verify under microscope.

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Primary facility''' || ANFF-Q (AIBN)
|-
| '''Key instruments''' || Hot embosser (ANFF-Q) · DRIE (ANFF-Q) · Oxford Lasers micromachining
|}

----

=== Workflow 3 — EBL-Defined Nanoscale Features in Microfluidic Devices ===

''For sub-micron features (nanochannels, nanofilters, plasmonic sensors in microfluidics). Combines EBL at CMM with DRIE or RIE at ANFF-Q, then PDMS integration at Long Pocket.''

'''Facility route:''' CMM → CMM → ANFF-Q → CMM → Long Pocket

==== Steps ====

# '''Resist Coat and EBL Exposure''' Plasma clean substrate, spin coat ZEP520A or PMMA, bake. Expose nano-features using EBPG5150 (100 kV) for sub-100 nm features. Use eLINE Plus for CD-SEM verification of pattern dimensions.
# '''Develop and Inspect''' Develop in ZED-N50 (ZEP) or MIBK:IPA (PMMA). Rinse and dry. Inspect pattern quality and critical dimensions using eLINE Plus CD-SEM or Filmtek for resist thickness confirmation.
# '''Etch or Metal Deposition''' For nanochannels: RIE to transfer pattern into Si or SiO₂. For plasmonic nanostructures: e-beam evaporation of Au/Ti followed by lift-off. DRIE for deep features or through-wafer channels.
# '''Metrology — Verify Etch Depth and Feature Size''' Measure etch depth with Dektak XT (contact profilometer) or OLS5500 confocal. Verify sidewall quality with AFM if needed.
# '''PDMS Integration and Bonding''' Integrate patterned substrate with PDMS microfluidic channels. Plasma activate both surfaces and bond. Verify channel alignment and seal integrity.

{{Note|This workflow crosses three facilities — CMM (EBL), ANFF-Q (etch/deposition), and Long Pocket (PDMS). Make sure you have RIMS access at both CMM and ANFF-Q before starting.}}

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Facilities''' || CMM (Hawken) — EBL · ANFF-Q (AIBN) — etch/dep. · Long Pocket — PDMS
|-
| '''Key instruments''' || Raith EBPG5150 (100 kV) · eLINE Plus (CD-SEM) · Oxford RIE · DRIE (ANFF-Q)
|}

----

=== Workflow 4 — Bio-Optomechanical Devices (Nanobeams, Membranes, Optical Traps) ===

''Suspended SiNx or Si nanobeams and membranes for optomechanical sensing of biological specimens. High-resolution EBL for nanoscale features, DRIE/XeF₂ for device release.''

'''Facility route:''' ANFF-Q → CMM → ANFF-Q → ANFF-Q → CMM

==== Steps ====

# '''SiNx or Si Device Layer Deposition''' Deposit low-stress silicon nitride (SiNx) via ICP-CVD or LPCVD. Thickness defines mechanical properties (resonance frequency, Q-factor). For SOI devices, use commercial SOI wafers.
# '''EBL Patterning of Nanobeams / Membrane Features''' Spin HSQ or ZEP on device layer. Expose nanoscale beam and hole patterns using EBPG5150 at 100 kV. Beam widths typically 100–500 nm; holes <200 nm for photonic crystal membranes.
# '''RIE Etch of Device Layer''' Transfer EBL pattern into SiNx or Si device layer by RIE. Use SF₆/CHF₃ chemistry for SiNx. Vertical, anisotropic etch critical for well-defined device geometry.
# '''Device Release''' Release suspended structures by selectively removing the sacrificial oxide layer. XeF₂ or vapour HF for isotropic SiO₂ undercut and release without stiction. Critical step — handle carefully to avoid collapse.
# '''Metrology — Verify Dimensions and Surface Quality''' Image released structures with SEM to verify beam dimensions and undercut. Measure surface roughness via AFM. Use OLS5500 for non-contact topography of fragile released devices.

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Facilities''' || CMM (Hawken) — EBL · ANFF-Q (AIBN) — dep./etch
|-
| '''Key instruments''' || Raith EBPG5150 (100 kV) · ICP-CVD (ANFF-Q) · XeF₂ etcher (ANFF-Q) · PRIMAXX vapour HF
|}

----

== Photonics — Si Photonics, Metalenses, Integrated Photonics ==

Nanofabrication workflows for integrated photonic devices. EBL at CMM is the primary patterning tool for sub-100 nm waveguides, gratings, and metasurface elements. RIE at ANFF-Q for pattern transfer.

=== Workflow 1 — Silicon Photonics: Waveguides, Ring Resonators, Grating Couplers ===

''EBL-defined silicon-on-insulator (SOI) waveguide devices. Critical dimensions typically 200–500 nm width. ZEP or HSQ as hard mask for high-quality sidewalls after ICP-RIE.''

'''Facility route:''' CMM → CMM → ANFF-Q → CMM → ANFF-Q

==== Steps ====

# '''Substrate Prep and Resist Coating''' Clean SOI wafer in Diener plasma cleaner to remove organics. Spin ZEP520A (positive-tone etch mask) or HSQ 6% (negative-tone high-resolution hard mask). Bake on CEE Apogee hotplate.
# '''EBL Exposure — Waveguides and Grating Couplers''' Expose waveguide layout at 100 kV on EBPG5150. Use proximity correction (BEAMER) for dense grating coupler regions. Typical dose: 160–200 µC/cm² for ZEP at 100 kV. Verify CD with eLINE Plus after develop.
# '''ICP / RIE Etch of Si Device Layer''' Transfer waveguide pattern into Si device layer by ICP or RIE using HBr/Cl₂ or SF₆/C₄F₈ chemistry. Etch depth = Si layer thickness (typically 220 nm for standard SOI). Sidewall angle and roughness are critical for propagation loss.
# '''Metrology — SEM Inspection and Profilometry''' Inspect waveguide cross-section in SEM to verify etch depth and sidewall angle. Measure step height with Dektak XT. Surface roughness via AFM — critical for propagation loss estimation.
# '''Optional: SiO₂ Cladding Deposition''' Deposit upper SiO₂ cladding by ICP-CVD or sputtering to achieve symmetric waveguide mode and protect device. Index matching between core and cladding determines mode confinement.

{{Hint|Grating couplers and dense photonic crystal regions require BEAMER proximity correction. Factor this into your pattern file preparation time before the EBL session.}}

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Facilities''' || CMM (Hawken) — EBL + metrology · ANFF-Q (AIBN) — etch/dep.
|-
| '''Key instruments''' || Raith EBPG5150 (100 kV) · eLINE Plus (CD-SEM) · Oxford RIE · ICP-CVD (ANFF-Q)
|-
| '''Typical resists''' || ZEP520A (positive, etch mask) · HSQ 6% (negative, hard mask) · PMMA (lift-off for metal contacts)
|}

----

=== Workflow 2 — Metalens and Metasurfaces: TiO₂, GaN, Si Nanopillars ===

''High-aspect-ratio dielectric nanopillars (TiO₂, GaN, or Si) patterned by EBL and etched for flat optics applications. Sub-100 nm pillar diameters with high aspect ratios require careful etch optimisation.''

'''Facility route:''' ANFF-Q → CMM → CMM → ANFF-Q → CMM

==== Steps ====

# '''Device Layer Deposition (TiO₂ / GaN / Si)''' Deposit high-index dielectric layer by sputtering (TiO₂, SiNx) or CVD. Layer thickness defines pillar height and operating wavelength. ALD-deposited TiO₂ preferred for visible-wavelength metalenses.
# '''HSQ Hard Mask Exposure (EBPG5150)''' Spin HSQ negative-tone resist directly on device layer. Expose pillar array at 100 kV — high dose (1,200–1,800 µC/cm²) required. HSQ acts as a hard mask with excellent etch selectivity. Dense pillar arrays benefit from proximity correction.
# '''Develop and CD-SEM Verification''' Develop in TMAH 25%. HSQ crosslinks to SiO₂-like material — undeveloped HSQ dissolves. Image pillar pattern in eLINE Plus CD-SEM to verify diameter, pitch, and dose-related deviations before etching.
# '''High-Aspect-Ratio RIE Etch of Pillars''' Etch device layer through HSQ mask using Cl₂/BCl₃ (TiO₂, GaN) or HBr/SF₆ (Si). Target aspect ratio 10:1 or greater. Sidewall passivation chemistry critical for vertical profiles. Contact ANFF-Q staff for chemistry advice.
# '''SEM / AFM Characterisation of Pillar Array''' Image pillar array in SEM — tilt view to assess sidewall angle and height. FIB cross-section for precise aspect ratio measurement. AFM for surface roughness on pillar tops.

{{Warning|HSQ calibration on the EBPG5150 is currently marked as due for update. Run a dose array on your first metalens exposure before committing to a full chip.}}

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Facilities''' || CMM (Hawken) — EBL + SEM · ANFF-Q (AIBN) — dep./etch
|-
| '''Key instruments''' || Raith EBPG5150 — HSQ exposure · eLINE Plus — CD-SEM · Sputtering system (ANFF-Q) · Oxford RIE (ANFF-Q)
|}

----

=== Workflow 3 — Plasmonic Nanostructures: Gold Nanoantennas, Bow-Ties, Nanogaps ===

''EBL lift-off of Au/Ti nanostructures for SERS, near-field enhancement, and optical antenna applications. Sub-50 nm gap features achievable at 100 kV.''

'''Facility route:''' CMM → CMM → ANFF-Q → CMM → ANFF-Q

==== Steps ====

# '''Bilayer PMMA Resist Coat''' Spin PMMA A2 (lower layer) then A4 (upper layer) to create a controlled undercut profile. Bake between layers. Undercut ensures clean lift-off separation.
# '''EBL Exposure and Develop''' Expose nanoantenna patterns at 100 kV. Dose ~350–400 µC/cm² for PMMA A4 on SiO₂. Develop in MIBK:IPA 1:3 for 60 s at 23 °C. Inspect gaps in eLINE CD-SEM before proceeding.
# '''Au / Ti E-Beam Evaporation''' Deposit 2–5 nm Ti adhesion layer, then 20–50 nm Au by e-beam evaporation. Low deposition rate (<0.5 Å/s) for Au to minimise resist heating. Keep total metal thickness well below resist thickness for clean lift-off.
# '''Lift-Off in Acetone''' Soak in acetone (or NMP for stubborn lift-off) to dissolve PMMA and remove metal from unwanted areas. Ultrasonication at low power assists lift-off without damaging structures. Rinse in IPA, dry.
# '''SEM Characterisation and Gap Verification''' Image nanoantenna array in SEM. Verify gap dimensions and structure quality. Use WITec Raman-AFM-SNOM for optical near-field characterisation if needed.

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Facilities''' || CMM (Hawken) — EBL · ANFF-Q (AIBN) — dep./SEM
|-
| '''Key instruments''' || Raith EBPG5150 · eLINE Plus (CD-SEM) · E-beam evaporation (ANFF-Q) · JEOL IT-300 SEM (ANFF-Q) · WITec Raman-AFM-SNOM
|}

----

== MEMS — Bulk and Surface Micromachining ==

Fabrication workflows for MEMS devices including cantilevers, membranes, accelerometers, and resonators. Relies on ANFF-Q DRIE for deep Si etching and XeF₂ / vapour HF for device release.

=== Workflow 1 — Si / SiNx Cantilevers and Mechanical Resonators ===

''Fabrication of free-standing cantilevers and doubly-clamped beams by top-down lithography and wet or dry release. Used for AFM probes, mass sensors, and optomechanical resonators.''

'''Facility route:''' ANFF-Q → CMM → ANFF-Q → ANFF-Q → CMM

==== Steps ====

# '''SiNx Device Layer Deposition''' Deposit low-stress SiNx by LPCVD or ICP-CVD on Si/SiO₂ substrate. Stress control is critical — stoichiometry determines residual stress and resonance frequency of the final beam.
# '''EBL or Optical Lithography Patterning''' For sub-micron beam widths use EBPG5150 with ZEP or HSQ. For beams >1 µm, ANFF-Q photolithography is sufficient and faster. Pattern defines beam outline and any integrated nanostructures (holes, tips).
# '''RIE Etch of SiNx Layer''' Etch SiNx through resist mask using CHF₃/O₂ or SF₆/CHF₃ chemistry in RIE. Timed etch — stop on SiO₂ or Si substrate. Vertical sidewalls important for well-defined beam geometry.
# '''Sacrificial Layer Release (XeF₂ or Vapour HF)''' Isotropically etch sacrificial oxide beneath SiNx beam to release free-standing structure. XeF₂ for Si undercut; vapour HF (PRIMAXX) for SiO₂ sacrificial layer. Both are dry-release processes — no stiction vs wet KOH.
# '''SEM and AFM Characterisation''' Image released cantilever in SEM to verify geometry and suspension. Measure surface roughness and beam profile with AFM. Tilted SEM view confirms undercut and beam suspension.

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Primary facility''' || ANFF-Q (AIBN)
|-
| '''Supporting''' || CMM (Hawken) — EBL (optional for sub-micron beams)
|-
| '''Key instruments''' || LPCVD furnace (ANFF-Q) · XeF₂ etcher (ANFF-Q) · PRIMAXX vapour HF · Oxford RIE (ANFF-Q)
|}

----

=== Workflow 2 — Bulk Si Micromachining: Deep Trenches, Through-Wafer Vias, Pressure Membranes ===

''DRIE Bosch process for high-aspect-ratio features in bulk silicon. Used for pressure sensors, inertial MEMS, and microfluidic master moulds.''

'''Facility route:''' ANFF-Q → ANFF-Q → ANFF-Q → CMM

==== Steps ====

# '''Hard Mask Deposition and Patterning''' Deposit SiO₂ or SiNx hard mask by ICP-CVD. Pattern by photolithography (ANFF-Q) for features >1 µm or EBL (CMM) for sub-micron. Etch hard mask in RIE before DRIE.
# '''DRIE — Bosch Process''' Alternating SF₆ etch / C₄F₈ passivation cycles to achieve vertical deep Si etching. Etch rate ~5–10 µm/min. Sidewall scalloping is characteristic — controllable by cycle parameters. Contact ANFF-Q staff for recipe advice.
# '''Hard Mask Strip and Dicing''' Strip hard mask in BOE (SiO₂) or H₃PO₄ (SiNx). Dice wafer into individual dies using dicing saw. Clean dies in piranha or standard RCA clean.
# '''Metrology — Etch Depth and Profile''' Measure etch depth with Dektak XT or OLS5500 (non-contact). FIB cross-section in SEM for sidewall profile assessment and scallop measurement.

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Primary facility''' || ANFF-Q (AIBN)
|-
| '''Metrology''' || CMM (Hawken)
|-
| '''Key instruments''' || DRIE — Bosch process (ANFF-Q) · Dicing saw (ANFF-Q) · Dektak XT profilometer
|}

----

=== Workflow 3 — Surface Micromachining: Polysilicon over Sacrificial Oxide ===

''Classic surface MEMS process: poly-Si structural layer deposited over sacrificial SiO₂, patterned, then released by HF etching. Suitable for actuators, comb drives, and gyroscopes.''

'''Facility route:''' ANFF-Q → ANFF-Q → ANFF-Q → ANFF-Q → ANFF-Q

==== Steps ====

# '''Sacrificial Oxide Deposition''' Grow or deposit SiO₂ sacrificial layer (thermal oxidation or ICP-CVD). Thickness determines the released gap between structural layer and substrate. Typically 0.5–2 µm.
# '''Poly-Si Structural Layer Deposition''' Deposit doped polysilicon by LPCVD. Thickness = structural layer thickness (typically 1–5 µm). Anneal to reduce residual stress. Doping ensures electrical conductivity for electrostatic actuation.
# '''Pattern Poly-Si Structural Layer''' Coat with photoresist (ANFF-Q photolithography suite) and pattern structural features — comb fingers, springs, anchor points. RIE etch poly-Si using SF₆ or HBr chemistry.
# '''Contact Metal Deposition and Patterning''' Deposit Al or Au contact pads by e-beam evaporation and pattern by lift-off or wet etch. Contacts to anchored regions only — flying structures must remain free.
# '''Sacrificial Oxide Release (Vapour HF)''' Selectively etch sacrificial SiO₂ using PRIMAXX vapour HF. Isotropic etch undercuts structural poly-Si to release moving parts. Dry release avoids stiction from surface tension. Etch time determines undercut extent — design release holes in structural layer accordingly.

{{Hint|Design etch-access holes in your structural poly-Si layer (typically 2–5 µm diameter, on a grid) to allow HF vapour to reach the sacrificial oxide underneath large structures.}}

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Primary facility''' || ANFF-Q (AIBN) — all steps
|-
| '''Key instruments''' || LPCVD furnace (ANFF-Q) · PRIMAXX vapour HF · RIE (ANFF-Q) · E-beam evaporation (ANFF-Q)
|}

----

== Quantum Devices — Superconducting Qubits, Spin Qubits, NV Centres ==

High-resolution EBL at CMM combined with superconducting metal deposition at SMP. Multi-facility workflow requiring coordination between CMM (EBPG5150) and SMP (angle evaporation).

=== Workflow 1 — Transmon Qubit: Al/AlOx/Al Dolan Bridge Josephson Junctions ===

''The standard Al double-angle evaporation process for transmon qubits. PMMA bilayer EBL at CMM followed by Al angle evaporation at SMP to form the AlOx tunnel barrier junction.''

'''Facility route:''' CMM → CMM → CMM → SMP → SMP → CMM

==== Steps ====

# '''Substrate Clean and PMMA Bilayer Coat''' Clean Si or sapphire substrate in Diener O₂/Ar plasma. Spin PMMA A2 (lower layer, softer — gives undercut) then PMMA A4 (upper layer, higher MW). Bake each layer on CEE Apogee hotplate. Bilayer essential for Dolan bridge geometry.
# '''EBPG5150 EBL — Qubit and Junction Pattern''' Expose qubit geometry (capacitor pads, coupling lines) and Dolan bridge at 100 kV. Junction bridge typically 100–200 nm wide. Dose ~350–400 µC/cm² for PMMA A4. Use BEAMER proximity correction for the dense junction region.
# '''Develop and Inspect''' Develop in MIBK:IPA 1:3 for 60–75 s at 23 °C. The bilayer creates a controlled undercut in the A2 layer. Inspect Dolan bridge dimensions in eLINE CD-SEM — bridge width and undercut are critical for junction area and Josephson energy.
# '''Double-Angle Al Evaporation at SMP''' Transfer sample to SMP superconducting evaporator. Evaporate first Al layer at +angle (e.g. +17°), oxidise in controlled O₂/Ar to form AlOx tunnel barrier, then evaporate second Al layer at −angle. The two layers overlap only under the bridge — this is the Josephson junction.
# '''Lift-Off''' Soak in acetone or NMP to dissolve PMMA and remove unwanted Al. Gentle ultrasonic agitation. Rinse in IPA. The junction and qubit geometry remain. Inspect in optical microscope before SEM.
# '''SEM Inspection and Metrology''' Image junction in SEM to verify bridge geometry and overlap area. Junction normal resistance (Rn) measured electrically at room temperature to estimate Josephson energy. FIB cross-section if oxide layer characterisation needed.

{{Note|This workflow requires RIMS accounts at CMM and access arranged with the SMP group. Confirm SMP evaporator availability before scheduling your EBL session — the sample should go from develop to evaporation within a few hours to avoid resist degradation.}}

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Facilities''' || CMM (Hawken) — EBL · SMP (Parnell) — Al evaporation
|-
| '''Key instruments''' || Raith EBPG5150 (100 kV) · eLINE Plus (CD-SEM) · SMP superconducting evaporator
|-
| '''Critical parameters''' || Bridge width: 100–200 nm · Al₁: ~30 nm · Oxidation: O₂/Ar 1–10 min · Al₂: ~60 nm · Target Rn: 5–15 kΩ
|}

----

=== Workflow 2 — Nb / NbTiN Microwave Resonators and Feedlines ===

''Coplanar waveguide resonators and transmission lines in Nb or NbTiN for qubit readout circuits. EBL-defined at CMM, Nb deposited at SMP.''

'''Facility route:''' SMP → CMM → ANFF-Q → CMM

==== Steps ====

# '''Nb or NbTiN Film Deposition at SMP''' Deposit Nb or NbTiN on Si or sapphire substrate at SMP. Film thickness = device layer thickness (typically 50–200 nm). Film quality (Tc, residual resistance) critical for resonator Q-factor.
# '''EBL Patterning of Resonator Geometry''' Coat with ZEP520A. Expose CPW resonator pattern (50 Ω gaps typically 4–10 µm) plus any sub-micron features at 100 kV on EBPG5150. Develop in ZED-N50.
# '''Nb RIE Etch''' Transfer pattern into Nb film by RIE using SF₆/Ar or CF₄/O₂ chemistry. Timed etch — stop on Si/sapphire substrate. Nb is a hard material — expect lower etch rates than Si.
# '''SEM Inspection''' Verify CPW gap dimensions and feature quality in SEM. Measure Nb film thickness via Dektak XT step height on a test area.

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Facilities''' || SMP (Parnell) — Nb dep. · CMM (Hawken) — EBL · ANFF-Q (AIBN) — etch
|-
| '''Key instruments''' || SMP superconducting evaporator · Raith EBPG5150 (100 kV) · Oxford RIE (ANFF-Q)
|}

----

== Organic Electronics — OLEDs, OPVs, Perovskite Devices ==

Fabrication workflows for organic light-emitting devices, organic photovoltaics, and perovskite solar cells. Primarily the COPE cleanroom at SCMB with supporting characterisation at ANFF-Q.

=== Workflow 1 — Small-Molecule OLED: ITO / HTL / EML / ETL / Al Cathode ===

''Standard vacuum-deposited small-molecule OLED stack. All organic layers deposited by thermal evaporation in COPE cleanroom. ITO anode patterned by photolithography at ANFF-Q.''

'''Facility route:''' ANFF-Q → COPE → COPE → ANFF-Q

==== Steps ====

# '''ITO Anode Deposition and Patterning''' Deposit ITO by sputtering at ANFF-Q. Pattern anode geometry by photolithography and wet etch. Clean ITO surface thoroughly — O₂ plasma treatment (ANFF-Q Tergeo cleaner) before organic deposition to improve wettability and hole injection.
# '''Organic Layer Deposition (COPE Evaporator)''' Sequentially deposit HTL (e.g. NPB), EML (host:guest system), ETL (e.g. Alq3), and LiF electron injection layer by thermal evaporation in COPE cleanroom under high vacuum. Each layer deposited through shadow masks.
# '''Al Cathode Deposition and Device Testing''' Deposit Al cathode through shadow mask without breaking vacuum. Test device J-V characteristics, luminance, and EL spectra using in-cleanroom probe station at COPE.
# '''Optical and Electrical Characterisation''' Full device characterisation at ANFF-Q: EL spectrum, CIE coordinates, efficiency (cd/A, lm/W). Solar simulator for OLED degradation studies. Confocal microscopy for emission uniformity.

{{Note|COPE cleanroom is primarily internal. Contact the COPE group via SCMB for collaborative access to this workflow.}}

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Primary facility''' || COPE (SCMB)
|-
| '''Supporting''' || ANFF-Q (AIBN) — ITO / characterisation
|-
| '''Key instruments''' || COPE organic thermal evaporator · Sputtering system (ANFF-Q) · Tergeo plasma cleaner (ANFF-Q) · Semiconductor analyser (ANFF-Q)
|}

----

=== Workflow 2 — Perovskite Solar Cell: n-i-p Planar Architecture ===

''Solution-processed perovskite absorber with TiO₂ electron transport layer and spiro-OMeTAD hole transport layer. Spin coating at COPE cleanroom.''

'''Facility route:''' ANFF-Q → COPE → COPE → ANFF-Q

==== Steps ====

# '''ITO Substrate Preparation''' Clean ITO-coated glass by sequential sonication in acetone, IPA, and deionised water. O₂ plasma clean (ANFF-Q Tergeo) immediately before deposition to improve surface energy.
# '''ETL and Perovskite Spin Coating''' Spin coat compact TiO₂ ETL (titanium isopropoxide in ethanol), anneal at 500 °C. Spin coat perovskite precursor solution (MAPbI₃ or mixed-halide) in glovebox or controlled atmosphere. Anti-solvent drip during spinning. Anneal at 100 °C.
# '''HTL and Au Contact Deposition''' Spin coat spiro-OMeTAD HTL. Evaporate Au back contact in COPE evaporator through shadow mask. Encapsulate device to prevent moisture degradation.
# '''J-V and IPCE Characterisation''' Measure PCE, Voc, Jsc, FF using Class AAA solar simulator. Measure IPCE/EQE spectrum. Stability testing under continuous illumination.

==== Summary ====

{| class="wikitable"
|-
! Parameter !! Detail
|-
| '''Primary facility''' || COPE (SCMB)
|-
| '''Supporting''' || ANFF-Q (AIBN) — characterisation
|-
| '''Key instruments''' || COPE spin coater (glovebox) · COPE evaporator · Class AAA solar simulator (ANFF-Q) · QE/IPCE/IV system (ANFF-Q) · Tergeo plasma cleaner (ANFF-Q)
|}

----

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{{DISPLAYTITLE:microQ — Queensland Nanofabrication Facility}}


{{Hatnote|This is an internal knowledge base for the microQ nanofabrication facility at The University of Queensland. It is not a Wikipedia article.}}

{| style="width:100%; border:2px solid #1a3557; border-radius:6px; background:#f0f4f8; padding:1em; margin-bottom:1.5em;"
|-
| style="font-size:1.6em; font-weight:bold; color:#1a3557; padding-bottom:0.2em;" | microQ — Queensland Nanofabrication Facility
|-
| style="color:#444; font-size:0.95em;" | A shared user facility at The University of Queensland providing access to state-of-the-art micro and nanofabrication tools, cleanroom infrastructure, and expert support for researchers across engineering, physics, chemistry, and the life sciences.
|}

__TOC__

== About This Wiki ==

This wiki is the central knowledge base for microQ users. Here you will find everything you need to plan, book, and execute your fabrication projects — from understanding which tools are available, to step-by-step process workflows, standard operating procedures, and upcoming training events.

If you are new to the facility, start with the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] to understand how to get access, then browse the [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] to see how your device type maps to our available tools.

----

== Our Purpose ==

microQ exists to make micro and nanofabrication accessible to the broadest possible research community at UQ and beyond. Our mission is to:

* Provide open access to cutting-edge fabrication and characterisation equipment
* Support researchers with expert technical staff and detailed process documentation
* Foster collaboration across disciplines and institutions
* Train the next generation of micro and nanofabrication scientists and engineers

Whether you are fabricating MEMS sensors, photonic integrated circuits, quantum devices, microfluidic chips, or organic electronics, microQ has the tools and expertise to support your work.

----

== History ==

microQ grew out of the Australian National Fabrication Facility Queensland Node (ANFF-Q), established as part of the national ANFF network to provide shared fabrication infrastructure to Australian researchers. Over time the facility expanded its scope, tools, and user base, becoming a hub for collaborative nanofabrication research across UQ's faculties and partner institutions.

Today microQ operates cleanroom spaces across multiple UQ campuses, housing tools for lithography, deposition, etching, characterisation, and more.

----

== Location and Facilities ==

microQ infrastructure is distributed across several UQ sites. Each site specialises in different process capabilities.

{| class="wikitable" style="width:100%;"
! Site !! Building !! Campus !! Specialisation
|-
| '''ANFF-Q''' || AIBN (Bldg #75) || St Lucia || Lithography, deposition, etching, characterisation
|-
| '''CMM''' || Hawken (Bldg #50) || St Lucia || Electron beam lithography, electron microscopy, surface analysis
|-
| '''SMP''' || Parnell (Bldg #7) || St Lucia || Superconducting device fabrication, low-temperature deposition
|-
| '''Long Pocket''' || Pandanus (Bldg #1022) || Long Pocket || Soft lithography, microfluidics, oxidation furnace
|-
| '''COPE''' || SCMB || St Lucia || Organic electronics, OLEDs, perovskite devices
|}

All sites operate under cleanroom conditions. Access requirements vary by site — see the [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] for details.

----

== Quick Navigation ==

The sections below give a brief overview of each knowledge area. Click the link to go to the full subpage.

=== [[User:YOURUSERNAME/sandbox/Workflows|Process Workflows]] ===

Step-by-step fabrication guides organised by device type. Each workflow shows the recommended sequence of tools and facilities, typical process parameters, and tips for common pitfalls. Currently covers:

* Bio-MEMS — microfluidics, PDMS soft lithography, hot embossing, bio-optomechanical devices
* Photonics — silicon photonics, metalenses, plasmonic nanostructures
* MEMS — cantilevers, bulk Si micromachining, surface micromachining
* Quantum devices — transmon qubits, superconducting resonators
* Organic / OLED — small-molecule OLEDs, perovskite solar cells

'''→ [[User:YOURUSERNAME/sandbox/Workflows|Go to Process Workflows]]'''

----

=== [[User:YOURUSERNAME/sandbox/Equipment|Equipment]] ===

Full catalogue of instruments available at microQ, organised by process category. Each entry includes a description, key specifications, available materials, substrate sizes, and contact information for the responsible staff member. Categories include:

* Deposition — e-beam evaporation, sputtering, ALD, oxidation furnace
* Etching — DRIE, RIE, XeF₂ etcher
* Lithography — mask aligner, maskless aligner, hot embosser, Nanoscribe, MPO100

'''→ [[User:YOURUSERNAME/sandbox/Equipment|Go to Equipment]]''' ''(coming soon)''

----

=== [[User:YOURUSERNAME/sandbox/SOPs|Standard Operating Procedures]] ===

Detailed step-by-step operating procedures for each instrument, written for trained users. SOPs cover safety requirements, startup and shutdown sequences, process parameters, and troubleshooting guides. All users must read the relevant SOP before operating any tool independently.

'''→ [[User:YOURUSERNAME/sandbox/SOPs|Go to Standard Operating Procedures]]''' ''(coming soon)''

----

=== [[User:YOURUSERNAME/sandbox/Booking|Booking Guide]] ===

Everything you need to know about getting access to microQ tools. This includes how to create a RIMS account, complete induction training, request tool access, book time slots, and understand fair-use and billing policies.

'''→ [[User:YOURUSERNAME/sandbox/Booking|Go to Booking Guide]]''' ''(coming soon)''

----

=== [[User:YOURUSERNAME/sandbox/Events|Events, Workshops & Forums]] ===

Upcoming training workshops, user forums, facility open days, and short courses. This page also archives past event materials including presentation slides and tutorial notes.

'''→ [[User:YOURUSERNAME/sandbox/Events|Go to Events & Workshops]]''' ''(coming soon)''

----

== Contact ==

{| class="wikitable"
! Role !! Contact
|-
| General enquiries || microq@uq.edu.au
|-
| ANFF-Q instruments || Kai-Yu Liu
|-
| EBL / CMM || Contact CMM directly via RIMS
|-
| Organic / OLED (COPE) || Contact SCMB
|}

For urgent facility issues during operating hours, contact the relevant site directly.

----

== How to Contribute to This Wiki ==

This wiki is maintained by microQ staff and trained users. If you would like to contribute a workflow, add an SOP, or correct an error:

# Create or log in to your Wikipedia account
# Navigate to the relevant subpage (e.g. <code>User:YOURUSERNAME/sandbox/Workflows</code>)
# Click '''Edit''' and make your changes
# Add a brief summary of your edit in the Edit summary box
# Click '''Publish changes'''

For major additions or structural changes, please discuss with microQ staff first.

----