Fernando.Gottardo1: Created page with "= Etching (Process Control Data) = Process Control data for varius dry etching recipes and tools in the lab. == ICP RIE - Process Control == === Si Etching === We have found that Si etching is fairly sensitive to chamber condition. * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=0#gid=0| ICP RIE - Si etch data] * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=1129004670#gi..."

2026-10-25T23:12:25Z

Created page with "= Etching (Process Control Data) = Process Control data for varius dry etching recipes and tools in the lab. == ICP RIE - Process Control == === Si Etching === We have found that Si etching is fairly sensitive to chamber condition. * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=0#gid=0| ICP RIE - Si etch data] * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=1129004670#gi..."

New page

= Etching (Process Control Data) =
Process Control data for varius dry etching recipes and tools in the lab.

== ICP RIE - Process Control ==

=== Si Etching ===
We have found that Si etching is fairly sensitive to chamber condition.

* [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=0#gid=0| ICP RIE - Si etch data]

* [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=1129004670#gid=1129004670| ICP RIE - Si etch plot]

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<a href="https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=1129004670#gid=1129004670" target="_blank">
<img src="http://localhost/wiki/images/c/cd/ICP_Si_etch.png" width="400" style="border:1px solid #ccc; padding:5px;">
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<b>Click to view The plot </b>
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=== SiO2 Etching ===
Data obtained in 2026-07-07 by Laxmiprasad and Fernando

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<img src="https://uq-my.sharepoint.com/:i:/r/personal/uqfgotar_uq_edu_au/Documents/Documents/NAPF/microQ/2026-08/Plots/SiO2_EtchRate_2026-07-07.png?d=w4afb29bfee2641bc88f8120d5a7f48e0&csf=1&web=1&e=RMFjLy" width="600" style="border:1px solid #ccc;">
<br>
<i>SiO₂ Etch Rate vs ICP RF Power - Resist used: AZ1512 - SiO2: thermal grown</i>
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VS NEW OneDrive Method

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<img src="https://uq-my.sharepoint.com/personal/uqfgotar_uq_edu_au/_layouts/15/download.aspx?UniqueId=4afb29bf-ee26-41bc-88f8-120d5a7f48e0" width="600" height="460" frameborder="0" scrolling="no" allowfullscreen title="SiO2_EtchRate_2026-07-07" width="600" style="border:1px solid #ccc; padding:5px;">
<br>
<i>SiO₂ Etch Rate vs ICP RF Power - Resist used: AZ1512 - SiO2: thermal grown</i>
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VS Github

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<img src="https://raw.githubusercontent.com/UQNANO/uQ-Technology-Forum/wiki/facilities/ANFF/ICP-RIE/Etch_data/Plots/SiO2_EtchRate_2026-07-07.png" width="600">
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Process Control Data - Revision history