Lithography: Revision history

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26 October 2026

  • curprev 09:1009:10, 26 October 2026 Fernando.Gottardo1 talk contribs 9,759 bytes +9,759 Created page with "This page lists all lithography tools available at the facility, including photolithography, electron beam lithography, nano 3D printing, and supporting equipment. == Electron Beam Lithography (EBL) == === Raith EBPG5150 === The Raith EBPG5150 is a 100 kV electron beam pattern generator offering sub-10 nm resolution capability. It is the primary tool for high-resolution and high-throughput EBL at the CMM facility (Hawken Engineering Building). '''Key Specifications'''..."
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