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- 09:10, 26 October 2026 Fernando.Gottardo1 talk contribs created page Lithography (Created page with "This page lists all lithography tools available at the facility, including photolithography, electron beam lithography, nano 3D printing, and supporting equipment. == Electron Beam Lithography (EBL) == === Raith EBPG5150 === The Raith EBPG5150 is a 100 kV electron beam pattern generator offering sub-10 nm resolution capability. It is the primary tool for high-resolution and high-throughput EBL at the CMM facility (Hawken Engineering Building). '''Key Specifications'''...")