New pages

26 October 2026

• 09:1209:12, 26 October 2026 Tutorials (hist | edit) [1,606 bytes] Fernando.Gottardo1 (talk | contribs) (Created page with "The following are various tutorials from our Wiki, collected here for your convenience. === General === * Need a service - Ordering procedure - see this page for how to submit your order into the system. * Tutorial - How Photomasks are Made - this will give you a better understanding of a photomask and clear up common misconceptions. === Direct-Write === right|400px|Caption here * MLA150 - Design Guidelines - Direct-writer sys...")
• 09:1209:12, 26 October 2026 Process Control Data (hist | edit) [1,961 bytes] Fernando.Gottardo1 (talk | contribs) (Created page with "= Etching (Process Control Data) = Process Control data for varius dry etching recipes and tools in the lab. == ICP RIE - Process Control == === Si Etching === We have found that Si etching is fairly sensitive to chamber condition. * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=0#gid=0| ICP RIE - Si etch data] * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=1129004670#gi...")
• 09:1109:11, 26 October 2026 Dry Etch (hist | edit) [4,345 bytes] Fernando.Gottardo1 (talk | contribs) (Created page with "== Process Control Data == ''See the linked Process Control Data page for process control data (etch rate, selectivity, etc. over time) for a selection of commonly used dry etches.'' == Dry Etching Tools/Materials Table == === Process Maturity Ranking === * <code>R6</code> - most mature process with regular calibrations recorded on SPC charts. * ... * <code>R1</code> - least mature — process has been run at least once. * <code>A</code> - process '''A'''llowed a...")
• 09:1109:11, 26 October 2026 Photonics (hist | edit) [1,635 bytes] Fernando.Gottardo1 (talk | contribs) (Created page with "== Photonics — Si photonics, metalenses, integrated photonics == ''Nanofabrication workflows for integrated photonic devices.'' === Si Photonics (waveguides, rings) === ==== Silicon photonics — waveguides, ring resonators, grating couplers ==== EBL-defined silicon-on-insulator (SOI) waveguide devices. Critical dimensions typically 200–500 nm width. {| style="width:100%;" cellpadding="10" valign="top" |- |style="width:70%; vertical-align:top;"| '''Step 1 — Sub...")
• 09:1009:10, 26 October 2026 Lithography (hist | edit) [9,759 bytes] Fernando.Gottardo1 (talk | contribs) (Created page with "This page lists all lithography tools available at the facility, including photolithography, electron beam lithography, nano 3D printing, and supporting equipment. == Electron Beam Lithography (EBL) == === Raith EBPG5150 === The Raith EBPG5150 is a 100 kV electron beam pattern generator offering sub-10 nm resolution capability. It is the primary tool for high-resolution and high-throughput EBL at the CMM facility (Hawken Engineering Building). '''Key Specifications'''...")