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• 09:27, 26 October 2026 Fernando.Gottardo1 talk contribs created page User:YOURUSERNAME/sandbox/Events (Created page with "thumb|center|500px|Flyer 2026")
• 09:24, 26 October 2026 Fernando.Gottardo1 talk contribs created page File:Flyer2026 4p3.png
• 09:24, 26 October 2026 Fernando.Gottardo1 talk contribs uploaded File:Flyer2026 4p3.png
• 09:23, 26 October 2026 Fernando.Gottardo1 talk contribs created page File:ANFF QLD Onboarding Guidelines.pdf
• 09:23, 26 October 2026 Fernando.Gottardo1 talk contribs uploaded File:ANFF QLD Onboarding Guidelines.pdf
• 09:12, 26 October 2026 Fernando.Gottardo1 talk contribs created page Tutorials (Created page with "The following are various tutorials from our Wiki, collected here for your convenience. === General === * Need a service - Ordering procedure - see this page for how to submit your order into the system. * Tutorial - How Photomasks are Made - this will give you a better understanding of a photomask and clear up common misconceptions. === Direct-Write === right|400px|Caption here * MLA150 - Design Guidelines - Direct-writer sys...")
• 09:12, 26 October 2026 Fernando.Gottardo1 talk contribs created page Process Control Data (Created page with "= Etching (Process Control Data) = Process Control data for varius dry etching recipes and tools in the lab. == ICP RIE - Process Control == === Si Etching === We have found that Si etching is fairly sensitive to chamber condition. * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=0#gid=0| ICP RIE - Si etch data] * [https://docs.google.com/spreadsheets/d/1Gwpl0NEzoSiHtOgeUIAUJxsTbUqey-GvSEwSgSBCPIo/edit?gid=1129004670#gi...")
• 09:11, 26 October 2026 Fernando.Gottardo1 talk contribs created page Dry Etch (Created page with "== Process Control Data == ''See the linked Process Control Data page for process control data (etch rate, selectivity, etc. over time) for a selection of commonly used dry etches.'' == Dry Etching Tools/Materials Table == === Process Maturity Ranking === * <code>R6</code> - most mature process with regular calibrations recorded on SPC charts. * ... * <code>R1</code> - least mature — process has been run at least once. * <code>A</code> - process '''A'''llowed a...")
• 09:11, 26 October 2026 Fernando.Gottardo1 talk contribs created page Photonics (Created page with "== Photonics — Si photonics, metalenses, integrated photonics == ''Nanofabrication workflows for integrated photonic devices.'' === Si Photonics (waveguides, rings) === ==== Silicon photonics — waveguides, ring resonators, grating couplers ==== EBL-defined silicon-on-insulator (SOI) waveguide devices. Critical dimensions typically 200–500 nm width. {| style="width:100%;" cellpadding="10" valign="top" |- |style="width:70%; vertical-align:top;"| '''Step 1 — Sub...")
• 09:10, 26 October 2026 Fernando.Gottardo1 talk contribs created page Lithography (Created page with "This page lists all lithography tools available at the facility, including photolithography, electron beam lithography, nano 3D printing, and supporting equipment. == Electron Beam Lithography (EBL) == === Raith EBPG5150 === The Raith EBPG5150 is a 100 kV electron beam pattern generator offering sub-10 nm resolution capability. It is the primary tool for high-resolution and high-throughput EBL at the CMM facility (Hawken Engineering Building). '''Key Specifications'''...")
• 09:09, 21 October 2026 Fernando.Gottardo1 talk contribs created page User:YOURUSERNAME/sandbox/Workflows (Created page with "{{DISPLAYTITLE:microQ — Process Workflows}} <!-- ================================================================ QNANO / microQ — Fabrication Process Workflows Paste this into your Wikipedia sandbox: https://en.wikipedia.org/wiki/User:YOURUSERNAME/sandbox ================================================================ --> '''Step-by-step fabrication guides''' for common device types — showing which UQ facility and instrument you need at each...")
• 09:05, 21 October 2026 User account Fernando.Gottardo1 talk contribs was created